Development Of Spacer Free
Self-Aligned Contact Implantation For Power Devices

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Development Of Spacer Free Self-Aligned Contact Implantation For Power Devices

Mengoptimasi skema proses integrasi bagi sesebuah teknolgi merupakan salah satu faktor penting untuk mengurangkan bilangan kecatatan dan kitaran masa dalam bidang fabrikasi wafer. Dalam pengajian sarjana ini, aliran proses yang dioptimasi bagi menjajarkan penimpalan kontak telah dikaji bagi teknolog...

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Bibliographic Details
Main Author:	Poobalan, Banu
Format:	Thesis
Language:	English
Published:	2009
Subjects:	TN1-997 Mining engineering. Metallurgy
Online Access:	http://eprints.usm.my/41784/ http://eprints.usm.my/41784/1/Banu_AP_Poobalan24.pdf

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