Inductively Coupled Plasma Etching On Gan

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Inductively Coupled Plasma Etching On Gan

Dalam projek ini, penyelidikan difokuskan kepada kajian tentang pengaruh pelbagai campuran plasma (H2 dan Ar) kepada Ch sebagai gas asas pada GaN menggunakan punaran kering khususnya punaran plasma yang digandingkan secara teraruh (ICP) untuk mendapatkan anisotropik yang tinggi In this project...

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Bibliographic Details
Main Author:	Rosli, Siti Azlina
Format:	Thesis
Language:	English
Published:	2010
Subjects:	QC1 Physics (General)
Online Access:	http://eprints.usm.my/29516/ http://eprints.usm.my/29516/1/Inductively_coupled_plasma_etching_on_GaN.pdf

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