Inductively Coupled Plasma Etching On Gan
Dalam projek ini, penyelidikan difokuskan kepada kajian tentang pengaruh pelbagai campuran plasma (H2 dan Ar) kepada Ch sebagai gas asas pada GaN menggunakan punaran kering khususnya punaran plasma yang digandingkan secara teraruh (ICP) untuk mendapatkan anisotropik yang tinggi In this project...
| Main Author: | |
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| Format: | Thesis |
| Language: | English |
| Published: |
2010
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| Subjects: | |
| Online Access: | http://eprints.usm.my/29516/ http://eprints.usm.my/29516/1/Inductively_coupled_plasma_etching_on_GaN.pdf |
| _version_ | 1848876122497875968 |
|---|---|
| author | Rosli, Siti Azlina |
| author_facet | Rosli, Siti Azlina |
| author_sort | Rosli, Siti Azlina |
| building | USM Institutional Repository |
| collection | Online Access |
| description | Dalam projek ini, penyelidikan difokuskan kepada kajian tentang pengaruh
pelbagai campuran plasma (H2 dan Ar) kepada Ch sebagai gas asas pada GaN
menggunakan punaran kering khususnya punaran plasma yang digandingkan secara
teraruh (ICP) untuk mendapatkan anisotropik yang tinggi
In this project, the research mainly focused on the investigation of the
influence of the various plasma mixtures (H2 and Ar) in Ch-based on GaN using dry
etching majoring in Inductively Coupled Plasma etching to obtain highly anisotropic |
| first_indexed | 2025-11-15T16:54:32Z |
| format | Thesis |
| id | usm-29516 |
| institution | Universiti Sains Malaysia |
| institution_category | Local University |
| language | English |
| last_indexed | 2025-11-15T16:54:32Z |
| publishDate | 2010 |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | usm-295162017-03-22T02:23:46Z http://eprints.usm.my/29516/ Inductively Coupled Plasma Etching On Gan Rosli, Siti Azlina QC1 Physics (General) Dalam projek ini, penyelidikan difokuskan kepada kajian tentang pengaruh pelbagai campuran plasma (H2 dan Ar) kepada Ch sebagai gas asas pada GaN menggunakan punaran kering khususnya punaran plasma yang digandingkan secara teraruh (ICP) untuk mendapatkan anisotropik yang tinggi In this project, the research mainly focused on the investigation of the influence of the various plasma mixtures (H2 and Ar) in Ch-based on GaN using dry etching majoring in Inductively Coupled Plasma etching to obtain highly anisotropic 2010-01 Thesis NonPeerReviewed application/pdf en http://eprints.usm.my/29516/1/Inductively_coupled_plasma_etching_on_GaN.pdf Rosli, Siti Azlina (2010) Inductively Coupled Plasma Etching On Gan. Masters thesis, USM. |
| spellingShingle | QC1 Physics (General) Rosli, Siti Azlina Inductively Coupled Plasma Etching On Gan |
| title | Inductively Coupled Plasma Etching On Gan |
| title_full | Inductively Coupled Plasma Etching On Gan |
| title_fullStr | Inductively Coupled Plasma Etching On Gan |
| title_full_unstemmed | Inductively Coupled Plasma Etching On Gan |
| title_short | Inductively Coupled Plasma Etching On Gan |
| title_sort | inductively coupled plasma etching on gan |
| topic | QC1 Physics (General) |
| url | http://eprints.usm.my/29516/ http://eprints.usm.my/29516/1/Inductively_coupled_plasma_etching_on_GaN.pdf |