Structural and optical properties of ZnO thin films deposited using atomic layer deposition technique

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Structural and optical properties of ZnO thin films deposited using atomic layer deposition technique

ZnO films have been successfully deposited by Atomic Layer Deposition (ALD) using Diethylzinc (DEZn) and water (H2O) as precursors.

Bibliographic Details
Main Author:	PPKBSM, Pusat Pengajian Bahan & Sumber Mineral
Format:	Conference or Workshop Item
Language:	English
Published:	2011
Subjects:	TN1-997 Mining engineering. Metallurgy
Online Access:	http://eprints.usm.my/25179/ http://eprints.usm.my/25179/1/STRUCTURAL_AND_OPTICAL_PROPERTIES_OF_ZnO_THIN_FILMS_DEPOSITED_USING_ATOMIC_LAYER_DEPOSITION_TECHNIQUE.pdf

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