Investigation of low dielectric constant (k) films for deep sub-micron CMOS application.

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Investigation of low dielectric constant (k) films for deep sub-micron CMOS application.

Silica (Si02) thin film on Si with low dielectric constant (k) properties has been systematically prepared and investigated. Two types of this low-k material have been deposited on Si via sol-gel spin-on coating. Filem nipis silika (Si02) yang berpemalar dieletrik rendah endap di atas Si tlah dis...

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Bibliographic Details
Main Authors:	Cheon'g, Kuan Yew, Hussain, Luay Bakir
Format:	Monograph
Published:	Universiti Sains Malaysia 2007
Subjects:	TN1-997 Mining engineering. Metallurgy
Online Access:	http://eprints.usm.my/10419/

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