Development Of Si02 Thin Film On singlecrystal Sic By anodic oxidation technique.

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Development Of Si02 Thin Film On singlecrystal Sic By anodic oxidation technique.

Anodic silicon dioxide (Si02) thin film is growth on p- and n-type silicon (Si) and p-type 4H-silicon carbide (SiC) substrate with the thickness ranging from 50-130 nm. Filem nipis Si02 tersadur anod telah ditumbuhkankan di atas substrat silikon (Si) jenis p dan n serta silikon karbida jenis-p de...

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Bibliographic Details
Main Authors:	Cheong, Kuan Yew, Purwadaria, Sunara, Lockman, Zainovia
Format:	Monograph
Published:	Universiti Sains Malaysia 2008
Subjects:	TN1-997 Mining engineering. Metallurgy
Online Access:	http://eprints.usm.my/10152/

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