Effect of annealing temperature on the performance of ZnO seed layer for photoanode in photoelectrochemical cells

Zinc oxide (ZnO) thin films were coated onto Indium Tin Oxide (ITO) glass substrate using spin coating technique as a function of annealing temperature. The thin film preparation was undertaken by utilising zinc acetate dihydrate, ethanol and diethanolamine as the precursors. The films were coated a...

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Main Authors: Al-Zahrani, Asla Abdullah, Zainal, Zulkarnain, Talib, Zainal Abidin, Lim, Hong Ngee, Mohd Fudzi, Laimy, Holi, Araa Mebdir, Mohd Ali, Mahanim Sarif
Format: Article
Language:English
Published: Trans Tech Publications 2020
Online Access:http://psasir.upm.edu.my/id/eprint/88567/
http://psasir.upm.edu.my/id/eprint/88567/1/ABSTRACT.pdf
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author Al-Zahrani, Asla Abdullah
Zainal, Zulkarnain
Talib, Zainal Abidin
Lim, Hong Ngee
Mohd Fudzi, Laimy
Holi, Araa Mebdir
Mohd Ali, Mahanim Sarif
author_facet Al-Zahrani, Asla Abdullah
Zainal, Zulkarnain
Talib, Zainal Abidin
Lim, Hong Ngee
Mohd Fudzi, Laimy
Holi, Araa Mebdir
Mohd Ali, Mahanim Sarif
author_sort Al-Zahrani, Asla Abdullah
building UPM Institutional Repository
collection Online Access
description Zinc oxide (ZnO) thin films were coated onto Indium Tin Oxide (ITO) glass substrate using spin coating technique as a function of annealing temperature. The thin film preparation was undertaken by utilising zinc acetate dihydrate, ethanol and diethanolamine as the precursors. The films were coated at room temperature prior to being annealed at temperatures ranging from 300 °C to 450 °C. The resulting crystalline structure and surface morphology of the thin films were then examined using X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM). UV-visible spectrophotometer was also used to record the optical absorbance in wavelengths ranging from 200 to 800 nm. The findings revealed that the ZnO thin films showed a single phase of wurtzite with n-type semiconductor, with the lowest value of band gap energy of 3.28 eV for ZnO thin films annealed at 350 °C. FESEM results showed that the ZnO nanoparticles were very compact on the surface, whereby the average particle size was equivalent to 108.5, 115.3, 108.2 and 107.8 nm at the temperatures 300 °C, 350 °C, 400 °C, and 450 °C, respectively. Additionally, the highest photoconversion efficiency (0.11%) recorded for the sample was annealed at 350◦C. Thus, annealing temperature was found to significantly affect the optical and electrical properties of ZnO nanoparticle seed layer, as well as its band gap energy and surface morphology.
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spelling upm-885672021-12-21T08:46:18Z http://psasir.upm.edu.my/id/eprint/88567/ Effect of annealing temperature on the performance of ZnO seed layer for photoanode in photoelectrochemical cells Al-Zahrani, Asla Abdullah Zainal, Zulkarnain Talib, Zainal Abidin Lim, Hong Ngee Mohd Fudzi, Laimy Holi, Araa Mebdir Mohd Ali, Mahanim Sarif Zinc oxide (ZnO) thin films were coated onto Indium Tin Oxide (ITO) glass substrate using spin coating technique as a function of annealing temperature. The thin film preparation was undertaken by utilising zinc acetate dihydrate, ethanol and diethanolamine as the precursors. The films were coated at room temperature prior to being annealed at temperatures ranging from 300 °C to 450 °C. The resulting crystalline structure and surface morphology of the thin films were then examined using X-ray diffraction (XRD) and field emission scanning electron microscopy (FESEM). UV-visible spectrophotometer was also used to record the optical absorbance in wavelengths ranging from 200 to 800 nm. The findings revealed that the ZnO thin films showed a single phase of wurtzite with n-type semiconductor, with the lowest value of band gap energy of 3.28 eV for ZnO thin films annealed at 350 °C. FESEM results showed that the ZnO nanoparticles were very compact on the surface, whereby the average particle size was equivalent to 108.5, 115.3, 108.2 and 107.8 nm at the temperatures 300 °C, 350 °C, 400 °C, and 450 °C, respectively. Additionally, the highest photoconversion efficiency (0.11%) recorded for the sample was annealed at 350◦C. Thus, annealing temperature was found to significantly affect the optical and electrical properties of ZnO nanoparticle seed layer, as well as its band gap energy and surface morphology. Trans Tech Publications 2020 Article PeerReviewed text en http://psasir.upm.edu.my/id/eprint/88567/1/ABSTRACT.pdf Al-Zahrani, Asla Abdullah and Zainal, Zulkarnain and Talib, Zainal Abidin and Lim, Hong Ngee and Mohd Fudzi, Laimy and Holi, Araa Mebdir and Mohd Ali, Mahanim Sarif (2020) Effect of annealing temperature on the performance of ZnO seed layer for photoanode in photoelectrochemical cells. Defect and Diffusion Forum, 398. 156 - 166. ISSN 1012-0386; ESSN: 1662-9507 https://www.scientific.net/DDF.398.156 10.4028/www.scientific.net/DDF.398.156
spellingShingle Al-Zahrani, Asla Abdullah
Zainal, Zulkarnain
Talib, Zainal Abidin
Lim, Hong Ngee
Mohd Fudzi, Laimy
Holi, Araa Mebdir
Mohd Ali, Mahanim Sarif
Effect of annealing temperature on the performance of ZnO seed layer for photoanode in photoelectrochemical cells
title Effect of annealing temperature on the performance of ZnO seed layer for photoanode in photoelectrochemical cells
title_full Effect of annealing temperature on the performance of ZnO seed layer for photoanode in photoelectrochemical cells
title_fullStr Effect of annealing temperature on the performance of ZnO seed layer for photoanode in photoelectrochemical cells
title_full_unstemmed Effect of annealing temperature on the performance of ZnO seed layer for photoanode in photoelectrochemical cells
title_short Effect of annealing temperature on the performance of ZnO seed layer for photoanode in photoelectrochemical cells
title_sort effect of annealing temperature on the performance of zno seed layer for photoanode in photoelectrochemical cells
url http://psasir.upm.edu.my/id/eprint/88567/
http://psasir.upm.edu.my/id/eprint/88567/
http://psasir.upm.edu.my/id/eprint/88567/
http://psasir.upm.edu.my/id/eprint/88567/1/ABSTRACT.pdf