On the fabrication of aluminum doped silica preform using MCVD and solution doping technique
This paper provides detailed discussions on the fabrication of aluminum doped silica preform using solution doping technique and modified chemical vapor deposition (MCVD). The porous core layer was deposited at 1750°C with 30cm in deposition length. The soot formed at the inlet and outlet segment of...
| Main Authors: | , , , , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
IEEE
2012
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| Online Access: | http://psasir.upm.edu.my/id/eprint/69505/ http://psasir.upm.edu.my/id/eprint/69505/1/On%20the%20fabrication%20of%20aluminum%20doped%20silica%20preform%20using%20MCVD%20and%20solution%20doping%20technique.pdf |
| _version_ | 1848856427264737280 |
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| author | Aljamimi, Salah Mohammed Mat Sharif, Khairul Anuar Muhamad Yassin, Shahrin Zen Zulkifli, Mohd Imran Tamchek, Nizam Yusoff, Zulfadzli Abdul Rashid, Hairul Azhar |
| author_facet | Aljamimi, Salah Mohammed Mat Sharif, Khairul Anuar Muhamad Yassin, Shahrin Zen Zulkifli, Mohd Imran Tamchek, Nizam Yusoff, Zulfadzli Abdul Rashid, Hairul Azhar |
| author_sort | Aljamimi, Salah Mohammed |
| building | UPM Institutional Repository |
| collection | Online Access |
| description | This paper provides detailed discussions on the fabrication of aluminum doped silica preform using solution doping technique and modified chemical vapor deposition (MCVD). The porous core layer was deposited at 1750°C with 30cm in deposition length. The soot formed at the inlet and outlet segment of the deposited length is analyzed using SEM for soot size and BET for pore size distribution. Refractive index profile of the doped preform is measured using preform analyzer. The refractive index difference obtained at the outlet and inlet segments shows uniform distribution of Al2O3, in agreement with the pore size distribution. |
| first_indexed | 2025-11-15T11:41:29Z |
| format | Conference or Workshop Item |
| id | upm-69505 |
| institution | Universiti Putra Malaysia |
| institution_category | Local University |
| language | English |
| last_indexed | 2025-11-15T11:41:29Z |
| publishDate | 2012 |
| publisher | IEEE |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | upm-695052019-07-04T04:45:51Z http://psasir.upm.edu.my/id/eprint/69505/ On the fabrication of aluminum doped silica preform using MCVD and solution doping technique Aljamimi, Salah Mohammed Mat Sharif, Khairul Anuar Muhamad Yassin, Shahrin Zen Zulkifli, Mohd Imran Tamchek, Nizam Yusoff, Zulfadzli Abdul Rashid, Hairul Azhar This paper provides detailed discussions on the fabrication of aluminum doped silica preform using solution doping technique and modified chemical vapor deposition (MCVD). The porous core layer was deposited at 1750°C with 30cm in deposition length. The soot formed at the inlet and outlet segment of the deposited length is analyzed using SEM for soot size and BET for pore size distribution. Refractive index profile of the doped preform is measured using preform analyzer. The refractive index difference obtained at the outlet and inlet segments shows uniform distribution of Al2O3, in agreement with the pore size distribution. IEEE 2012 Conference or Workshop Item PeerReviewed text en http://psasir.upm.edu.my/id/eprint/69505/1/On%20the%20fabrication%20of%20aluminum%20doped%20silica%20preform%20using%20MCVD%20and%20solution%20doping%20technique.pdf Aljamimi, Salah Mohammed and Mat Sharif, Khairul Anuar and Muhamad Yassin, Shahrin Zen and Zulkifli, Mohd Imran and Tamchek, Nizam and Yusoff, Zulfadzli and Abdul Rashid, Hairul Azhar (2012) On the fabrication of aluminum doped silica preform using MCVD and solution doping technique. In: 3rd International Conference on Photonics 2012 (ICP 2012), 1-3 Oct. 2012, Penang, Malaysia. (pp. 235-238). 10.1109/ICP.2012.6379518 |
| spellingShingle | Aljamimi, Salah Mohammed Mat Sharif, Khairul Anuar Muhamad Yassin, Shahrin Zen Zulkifli, Mohd Imran Tamchek, Nizam Yusoff, Zulfadzli Abdul Rashid, Hairul Azhar On the fabrication of aluminum doped silica preform using MCVD and solution doping technique |
| title | On the fabrication of aluminum doped silica preform using MCVD and solution doping technique |
| title_full | On the fabrication of aluminum doped silica preform using MCVD and solution doping technique |
| title_fullStr | On the fabrication of aluminum doped silica preform using MCVD and solution doping technique |
| title_full_unstemmed | On the fabrication of aluminum doped silica preform using MCVD and solution doping technique |
| title_short | On the fabrication of aluminum doped silica preform using MCVD and solution doping technique |
| title_sort | on the fabrication of aluminum doped silica preform using mcvd and solution doping technique |
| url | http://psasir.upm.edu.my/id/eprint/69505/ http://psasir.upm.edu.my/id/eprint/69505/ http://psasir.upm.edu.my/id/eprint/69505/1/On%20the%20fabrication%20of%20aluminum%20doped%20silica%20preform%20using%20MCVD%20and%20solution%20doping%20technique.pdf |