Atomic force microscope base nanolithography for reproducible micro and nanofabrication
Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable...
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| Format: | Conference or Workshop Item |
| Language: | English |
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IEEE
2014
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| Online Access: | http://psasir.upm.edu.my/id/eprint/68131/ http://psasir.upm.edu.my/id/eprint/68131/1/Atomic%20force%20microscope%20base%20nanolithography%20for%20reproducible%20micro%20and%20nanofabrication.pdf |
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| author | Dehzangi, Arash Larki, Farhad Yeop Majlis, Burhanuddin Kazemi, Zainab Ariannejad, Mohammadmahdi Abdullah, Ahmad Makarimi Naseri, Mahmoud Goodarz Navasery, Manizheh Saion, Elias Mohamed Kamari, Halimah Khalilzadeh, Nasrin Hutagalung, Sabar D. |
| author_facet | Dehzangi, Arash Larki, Farhad Yeop Majlis, Burhanuddin Kazemi, Zainab Ariannejad, Mohammadmahdi Abdullah, Ahmad Makarimi Naseri, Mahmoud Goodarz Navasery, Manizheh Saion, Elias Mohamed Kamari, Halimah Khalilzadeh, Nasrin Hutagalung, Sabar D. |
| author_sort | Dehzangi, Arash |
| building | UPM Institutional Repository |
| collection | Online Access |
| description | Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication. |
| first_indexed | 2025-11-15T11:35:20Z |
| format | Conference or Workshop Item |
| id | upm-68131 |
| institution | Universiti Putra Malaysia |
| institution_category | Local University |
| language | English |
| last_indexed | 2025-11-15T11:35:20Z |
| publishDate | 2014 |
| publisher | IEEE |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | upm-681312019-05-09T01:42:24Z http://psasir.upm.edu.my/id/eprint/68131/ Atomic force microscope base nanolithography for reproducible micro and nanofabrication Dehzangi, Arash Larki, Farhad Yeop Majlis, Burhanuddin Kazemi, Zainab Ariannejad, Mohammadmahdi Abdullah, Ahmad Makarimi Naseri, Mahmoud Goodarz Navasery, Manizheh Saion, Elias Mohamed Kamari, Halimah Khalilzadeh, Nasrin Hutagalung, Sabar D. Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication. IEEE 2014 Conference or Workshop Item PeerReviewed text en http://psasir.upm.edu.my/id/eprint/68131/1/Atomic%20force%20microscope%20base%20nanolithography%20for%20reproducible%20micro%20and%20nanofabrication.pdf Dehzangi, Arash and Larki, Farhad and Yeop Majlis, Burhanuddin and Kazemi, Zainab and Ariannejad, Mohammadmahdi and Abdullah, Ahmad Makarimi and Naseri, Mahmoud Goodarz and Navasery, Manizheh and Saion, Elias and Mohamed Kamari, Halimah and Khalilzadeh, Nasrin and Hutagalung, Sabar D. (2014) Atomic force microscope base nanolithography for reproducible micro and nanofabrication. In: 2014 IEEE International Conference on Semiconductor Electronics (ICSE), 27-29 Aug. 2014, Berjaya Times Square, Kuala Lumpur, Malaysia. (pp. 408-411). 10.1109/SMELEC.2014.6920884 |
| spellingShingle | Dehzangi, Arash Larki, Farhad Yeop Majlis, Burhanuddin Kazemi, Zainab Ariannejad, Mohammadmahdi Abdullah, Ahmad Makarimi Naseri, Mahmoud Goodarz Navasery, Manizheh Saion, Elias Mohamed Kamari, Halimah Khalilzadeh, Nasrin Hutagalung, Sabar D. Atomic force microscope base nanolithography for reproducible micro and nanofabrication |
| title | Atomic force microscope base nanolithography for reproducible micro and nanofabrication |
| title_full | Atomic force microscope base nanolithography for reproducible micro and nanofabrication |
| title_fullStr | Atomic force microscope base nanolithography for reproducible micro and nanofabrication |
| title_full_unstemmed | Atomic force microscope base nanolithography for reproducible micro and nanofabrication |
| title_short | Atomic force microscope base nanolithography for reproducible micro and nanofabrication |
| title_sort | atomic force microscope base nanolithography for reproducible micro and nanofabrication |
| url | http://psasir.upm.edu.my/id/eprint/68131/ http://psasir.upm.edu.my/id/eprint/68131/ http://psasir.upm.edu.my/id/eprint/68131/1/Atomic%20force%20microscope%20base%20nanolithography%20for%20reproducible%20micro%20and%20nanofabrication.pdf |