Atomic force microscope base nanolithography for reproducible micro and nanofabrication

Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable...

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Main Authors: Dehzangi, Arash, Larki, Farhad, Yeop Majlis, Burhanuddin, Kazemi, Zainab, Ariannejad, Mohammadmahdi, Abdullah, Ahmad Makarimi, Naseri, Mahmoud Goodarz, Navasery, Manizheh, Saion, Elias, Mohamed Kamari, Halimah, Khalilzadeh, Nasrin, Hutagalung, Sabar D.
Format: Conference or Workshop Item
Language:English
Published: IEEE 2014
Online Access:http://psasir.upm.edu.my/id/eprint/68131/
http://psasir.upm.edu.my/id/eprint/68131/1/Atomic%20force%20microscope%20base%20nanolithography%20for%20reproducible%20micro%20and%20nanofabrication.pdf
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author Dehzangi, Arash
Larki, Farhad
Yeop Majlis, Burhanuddin
Kazemi, Zainab
Ariannejad, Mohammadmahdi
Abdullah, Ahmad Makarimi
Naseri, Mahmoud Goodarz
Navasery, Manizheh
Saion, Elias
Mohamed Kamari, Halimah
Khalilzadeh, Nasrin
Hutagalung, Sabar D.
author_facet Dehzangi, Arash
Larki, Farhad
Yeop Majlis, Burhanuddin
Kazemi, Zainab
Ariannejad, Mohammadmahdi
Abdullah, Ahmad Makarimi
Naseri, Mahmoud Goodarz
Navasery, Manizheh
Saion, Elias
Mohamed Kamari, Halimah
Khalilzadeh, Nasrin
Hutagalung, Sabar D.
author_sort Dehzangi, Arash
building UPM Institutional Repository
collection Online Access
description Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication.
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format Conference or Workshop Item
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institution Universiti Putra Malaysia
institution_category Local University
language English
last_indexed 2025-11-15T11:35:20Z
publishDate 2014
publisher IEEE
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spelling upm-681312019-05-09T01:42:24Z http://psasir.upm.edu.my/id/eprint/68131/ Atomic force microscope base nanolithography for reproducible micro and nanofabrication Dehzangi, Arash Larki, Farhad Yeop Majlis, Burhanuddin Kazemi, Zainab Ariannejad, Mohammadmahdi Abdullah, Ahmad Makarimi Naseri, Mahmoud Goodarz Navasery, Manizheh Saion, Elias Mohamed Kamari, Halimah Khalilzadeh, Nasrin Hutagalung, Sabar D. Atomic force microscopy nanolithography (AFM) is a strong fabrication method for micro and nano structure due to its high spatial resolution and positioning abilities. Mixing AFM nanolithography with advantage of silicon-on-insulator (SOI) technology provides the opportunity to achieve more reliable Si nanostructures. In this letter, we try to investigate the reproducibility of AFM base nanolithography for fabrication of the micro/nano structures. In this matter local anodic oxidation (LAO) procedure applied to pattern a silicon nanostructure on p-type (1015 cm-3) SOI using AFM base nanolithography. Then chemical etching is applied, as potassium hydroxide (saturated with isopropyl alcohol) and hydrofluoric etching for removing of Si and oxide layer, respectively. All parameters contributed in fabrication process were optimized and the final results revealed a good potential for using AFM base nanolithography in order to get a reproducible method of fabrication. IEEE 2014 Conference or Workshop Item PeerReviewed text en http://psasir.upm.edu.my/id/eprint/68131/1/Atomic%20force%20microscope%20base%20nanolithography%20for%20reproducible%20micro%20and%20nanofabrication.pdf Dehzangi, Arash and Larki, Farhad and Yeop Majlis, Burhanuddin and Kazemi, Zainab and Ariannejad, Mohammadmahdi and Abdullah, Ahmad Makarimi and Naseri, Mahmoud Goodarz and Navasery, Manizheh and Saion, Elias and Mohamed Kamari, Halimah and Khalilzadeh, Nasrin and Hutagalung, Sabar D. (2014) Atomic force microscope base nanolithography for reproducible micro and nanofabrication. In: 2014 IEEE International Conference on Semiconductor Electronics (ICSE), 27-29 Aug. 2014, Berjaya Times Square, Kuala Lumpur, Malaysia. (pp. 408-411). 10.1109/SMELEC.2014.6920884
spellingShingle Dehzangi, Arash
Larki, Farhad
Yeop Majlis, Burhanuddin
Kazemi, Zainab
Ariannejad, Mohammadmahdi
Abdullah, Ahmad Makarimi
Naseri, Mahmoud Goodarz
Navasery, Manizheh
Saion, Elias
Mohamed Kamari, Halimah
Khalilzadeh, Nasrin
Hutagalung, Sabar D.
Atomic force microscope base nanolithography for reproducible micro and nanofabrication
title Atomic force microscope base nanolithography for reproducible micro and nanofabrication
title_full Atomic force microscope base nanolithography for reproducible micro and nanofabrication
title_fullStr Atomic force microscope base nanolithography for reproducible micro and nanofabrication
title_full_unstemmed Atomic force microscope base nanolithography for reproducible micro and nanofabrication
title_short Atomic force microscope base nanolithography for reproducible micro and nanofabrication
title_sort atomic force microscope base nanolithography for reproducible micro and nanofabrication
url http://psasir.upm.edu.my/id/eprint/68131/
http://psasir.upm.edu.my/id/eprint/68131/
http://psasir.upm.edu.my/id/eprint/68131/1/Atomic%20force%20microscope%20base%20nanolithography%20for%20reproducible%20micro%20and%20nanofabrication.pdf