Simple synthesis of large-area multilayer graphene films on dielectric substrate via chemical vapor deposition route (synthesis of MLG films on dielectric substrates via CVD route)
A systematic study of three distinct process variables to optimize the maximum formation of multilayer graphene (MLG) thin films grown over an alumina substrate supported Co-Ni catalyst was performed. The three considered parameters were the reaction temperature, catalyst composition, and ethanol fl...
| Main Authors: | , , , |
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| Format: | Conference or Workshop Item |
| Language: | English |
| Published: |
IEEE
2016
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| Online Access: | http://psasir.upm.edu.my/id/eprint/56312/ http://psasir.upm.edu.my/id/eprint/56312/1/Simple%20synthesis%20of%20large-area%20multilayer%20graphene%20films%20on%20dielectric%20substrate%20via.pdf |
| Summary: | A systematic study of three distinct process variables to optimize the maximum formation of multilayer graphene (MLG) thin films grown over an alumina substrate supported Co-Ni catalyst was performed. The three considered parameters were the reaction temperature, catalyst composition, and ethanol flow rate. The optimization process was employed to ensure a high performance in the utilized experimental ranges and to evaluate the interactive effects of the three parameters on the MLG yield of the ethanol-based chemical vapor deposition (CVD) method for potential gas-sensing applications. The synthesis and physical properties of the MLG characterized over the 0.3Co-0.7Ni/Al2O3 catalyst under optimum conditions were characterized using X-ray diffraction (XRD) (Rigaku; MiniFlex diffractometer with a Cu Kα radiation source, λ=0.15418 nm), field emission scanning electron microscopy (FESEM) (JSM-7800F) and Raman spectroscopy (RS) (Jobin Yvon Horiba HR800UV) analysis. |
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