Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell

Compact TiO2 has been introduced onto the surface of an indium tin oxide glass slide (ITO), using an aerosol-assisted chemical vapour deposition method. This serves as a blocking layer for a dye-sensitised solar cell (DSSC). The thickness of the compact TiO2 could be controlled by deposition time. X...

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Main Authors: Lim, Su Pei, Huang, Nay Ming, Lim, Hong Ngee, Mazhar, Muhammad
Format: Article
Language:English
Published: Elsevier 2014
Online Access:http://psasir.upm.edu.my/id/eprint/36339/
http://psasir.upm.edu.my/id/eprint/36339/1/Aerosol%20assisted%20chemical%20vapour%20deposited.pdf
_version_ 1848848304360652800
author Lim, Su Pei
Huang, Nay Ming
Lim, Hong Ngee
Mazhar, Muhammad
author_facet Lim, Su Pei
Huang, Nay Ming
Lim, Hong Ngee
Mazhar, Muhammad
author_sort Lim, Su Pei
building UPM Institutional Repository
collection Online Access
description Compact TiO2 has been introduced onto the surface of an indium tin oxide glass slide (ITO), using an aerosol-assisted chemical vapour deposition method. This serves as a blocking layer for a dye-sensitised solar cell (DSSC). The thickness of the compact TiO2 could be controlled by deposition time. X-ray diffraction and Raman spectroscopy analyses reveal that the compact TiO2 is made up of mixed anatase and rutile phases. The field emission scanning electron microscopy image displays a pyramidal morphology of the compact TiO2. A layer of P25 paste was then smeared onto the compact TiO2-modified ITO, using the doctor's blade method. A post-treatment procedure was applied to remove the contaminants from the prepared hybrid film, by immersing in a hydrochloric acid solution. The photoelectrochemical measurements and J–V characterisation of the hybrid film show an approximately fourfold increase in photocurrent density generation (114.22 µA/cm2), and approximately 25% enhancement of DSSC conversion efficiency (4.63%), compared to the acid-treated P25 paste alone (3.68%).
first_indexed 2025-11-15T09:32:22Z
format Article
id upm-36339
institution Universiti Putra Malaysia
institution_category Local University
language English
last_indexed 2025-11-15T09:32:22Z
publishDate 2014
publisher Elsevier
recordtype eprints
repository_type Digital Repository
spelling upm-363392015-10-01T02:05:43Z http://psasir.upm.edu.my/id/eprint/36339/ Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell Lim, Su Pei Huang, Nay Ming Lim, Hong Ngee Mazhar, Muhammad Compact TiO2 has been introduced onto the surface of an indium tin oxide glass slide (ITO), using an aerosol-assisted chemical vapour deposition method. This serves as a blocking layer for a dye-sensitised solar cell (DSSC). The thickness of the compact TiO2 could be controlled by deposition time. X-ray diffraction and Raman spectroscopy analyses reveal that the compact TiO2 is made up of mixed anatase and rutile phases. The field emission scanning electron microscopy image displays a pyramidal morphology of the compact TiO2. A layer of P25 paste was then smeared onto the compact TiO2-modified ITO, using the doctor's blade method. A post-treatment procedure was applied to remove the contaminants from the prepared hybrid film, by immersing in a hydrochloric acid solution. The photoelectrochemical measurements and J–V characterisation of the hybrid film show an approximately fourfold increase in photocurrent density generation (114.22 µA/cm2), and approximately 25% enhancement of DSSC conversion efficiency (4.63%), compared to the acid-treated P25 paste alone (3.68%). Elsevier 2014-07 Article PeerReviewed application/pdf en http://psasir.upm.edu.my/id/eprint/36339/1/Aerosol%20assisted%20chemical%20vapour%20deposited.pdf Lim, Su Pei and Huang, Nay Ming and Lim, Hong Ngee and Mazhar, Muhammad (2014) Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell. Ceramics International, 40 (6). pp. 8045-8052. ISSN 0272-8842; ESSN: 1873-3956 10.1016/j.ceramint.2013.12.156
spellingShingle Lim, Su Pei
Huang, Nay Ming
Lim, Hong Ngee
Mazhar, Muhammad
Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell
title Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell
title_full Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell
title_fullStr Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell
title_full_unstemmed Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell
title_short Aerosol assisted chemical vapour deposited (AACVD) of TiO2 thin film as compact layer for dye-sensitised solar cell
title_sort aerosol assisted chemical vapour deposited (aacvd) of tio2 thin film as compact layer for dye-sensitised solar cell
url http://psasir.upm.edu.my/id/eprint/36339/
http://psasir.upm.edu.my/id/eprint/36339/
http://psasir.upm.edu.my/id/eprint/36339/1/Aerosol%20assisted%20chemical%20vapour%20deposited.pdf