Sorption removal of arsenic (V) by Sn-loaded poly(hydroxamic) acid chelating resin
Sorption conditions of arsenate ions onto Sn-loaded poly (hydroxamic acid) chelating resin (Sn-PHA) have been studied. Sorption isotherms data correlated well to the Langmuir model with maximum capacity of 38.46 mg g-1 at pH 2. Sorption process follows pseudo-second order kinetics. Intraparticle dif...
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Japan Association of Ion Exchange
2007
|
| Online Access: | http://psasir.upm.edu.my/id/eprint/34646/ http://psasir.upm.edu.my/id/eprint/34646/1/34646.pdf |
| Summary: | Sorption conditions of arsenate ions onto Sn-loaded poly (hydroxamic acid) chelating resin (Sn-PHA) have been studied. Sorption isotherms data correlated well to the Langmuir model with maximum capacity of 38.46 mg g-1 at pH 2. Sorption process follows pseudo-second order kinetics. Intraparticle diffusion was found to take part in sorption processes. The free energy (E) was 11.18 kJ mol-1 which shows the sorption is an ion-exchange process. Thermodynamic parameters, ΔH°, ΔS° and ΔG° were also calculated from the experimental data. Standard heat of sorption was found to be endothermic and entropy change value was calculated to be positive. Negative ΔG° value indicates that the sorption process for the arsenic anions onto Sn-PHA is spontaneous. |
|---|