MOCVD-grown indium phosphide nanowires for optoelectronics

We demonstrate how growth parameters may be adopted to produce morphologically controlled high-quality indium phosphide (InP) nanowires suitable for optoelectronic device applications. Growth temperature, V/III ratio, and catalyst particle size have a significant effect on the morphology, crystallog...

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Main Authors: Paiman, Suriati, Gao, Qiang, Joyce, Hannah, Tan, Hark Hoe, Jagadish, Chennupati, Kim, Yong, Guo, Yanan, Kuranananda, Pemasiri, Mohammad, Montazeri, Howard, Jackson, Leigh, Smith
Format: Article
Language:English
Published: Trans Tech Publications 2014
Online Access:http://psasir.upm.edu.my/id/eprint/34538/
http://psasir.upm.edu.my/id/eprint/34538/1/MOCVD-grown%20indium%20phosphide%20nanowires%20for%20optoelectronics.pdf
_version_ 1848847800729600000
author Paiman, Suriati
Gao, Qiang
Joyce, Hannah
Tan, Hark Hoe
Jagadish, Chennupati
Kim, Yong
Guo, Yanan
Kuranananda, Pemasiri
Mohammad, Montazeri
Howard, Jackson
Leigh, Smith
author_facet Paiman, Suriati
Gao, Qiang
Joyce, Hannah
Tan, Hark Hoe
Jagadish, Chennupati
Kim, Yong
Guo, Yanan
Kuranananda, Pemasiri
Mohammad, Montazeri
Howard, Jackson
Leigh, Smith
author_sort Paiman, Suriati
building UPM Institutional Repository
collection Online Access
description We demonstrate how growth parameters may be adopted to produce morphologically controlled high-quality indium phosphide (InP) nanowires suitable for optoelectronic device applications. Growth temperature, V/III ratio, and catalyst particle size have a significant effect on the morphology, crystallographic quality, and optical properties of the resulting nanowires. Significantly, we find that higher growth temperatures or higher V/III ratios promote the formation of wurtzite (WZ) nanowires while zinc-blende (ZB) nanowires are favourable at lower growth temperatures and lower V/III ratios. Results also show that InP nanowires grow preferably in the WZ crystal structure than the ZB crystal structure with increasing V/III ratio or decreasing diameter. This causes a blue-shift in the bandgap as growth temperature increases. These results show that careful control of growth temperature, V/III ratio and catalyst size are crucial for obtaining InP nanowires of a specific crystal structure needed for device applications.
first_indexed 2025-11-15T09:24:22Z
format Article
id upm-34538
institution Universiti Putra Malaysia
institution_category Local University
language English
last_indexed 2025-11-15T09:24:22Z
publishDate 2014
publisher Trans Tech Publications
recordtype eprints
repository_type Digital Repository
spelling upm-345382016-09-19T03:17:40Z http://psasir.upm.edu.my/id/eprint/34538/ MOCVD-grown indium phosphide nanowires for optoelectronics Paiman, Suriati Gao, Qiang Joyce, Hannah Tan, Hark Hoe Jagadish, Chennupati Kim, Yong Guo, Yanan Kuranananda, Pemasiri Mohammad, Montazeri Howard, Jackson Leigh, Smith We demonstrate how growth parameters may be adopted to produce morphologically controlled high-quality indium phosphide (InP) nanowires suitable for optoelectronic device applications. Growth temperature, V/III ratio, and catalyst particle size have a significant effect on the morphology, crystallographic quality, and optical properties of the resulting nanowires. Significantly, we find that higher growth temperatures or higher V/III ratios promote the formation of wurtzite (WZ) nanowires while zinc-blende (ZB) nanowires are favourable at lower growth temperatures and lower V/III ratios. Results also show that InP nanowires grow preferably in the WZ crystal structure than the ZB crystal structure with increasing V/III ratio or decreasing diameter. This causes a blue-shift in the bandgap as growth temperature increases. These results show that careful control of growth temperature, V/III ratio and catalyst size are crucial for obtaining InP nanowires of a specific crystal structure needed for device applications. Trans Tech Publications 2014 Article PeerReviewed application/pdf en http://psasir.upm.edu.my/id/eprint/34538/1/MOCVD-grown%20indium%20phosphide%20nanowires%20for%20optoelectronics.pdf Paiman, Suriati and Gao, Qiang and Joyce, Hannah and Tan, Hark Hoe and Jagadish, Chennupati and Kim, Yong and Guo, Yanan and Kuranananda, Pemasiri and Mohammad, Montazeri and Howard, Jackson and Leigh, Smith (2014) MOCVD-grown indium phosphide nanowires for optoelectronics. Advanced Materials Research, 832. pp. 201-205. ISSN 1022-6680; ESSN: 1662-8985 http://www.scientific.net/AMR.832.201 10.4028/www.scientific.net/AMR.832.201
spellingShingle Paiman, Suriati
Gao, Qiang
Joyce, Hannah
Tan, Hark Hoe
Jagadish, Chennupati
Kim, Yong
Guo, Yanan
Kuranananda, Pemasiri
Mohammad, Montazeri
Howard, Jackson
Leigh, Smith
MOCVD-grown indium phosphide nanowires for optoelectronics
title MOCVD-grown indium phosphide nanowires for optoelectronics
title_full MOCVD-grown indium phosphide nanowires for optoelectronics
title_fullStr MOCVD-grown indium phosphide nanowires for optoelectronics
title_full_unstemmed MOCVD-grown indium phosphide nanowires for optoelectronics
title_short MOCVD-grown indium phosphide nanowires for optoelectronics
title_sort mocvd-grown indium phosphide nanowires for optoelectronics
url http://psasir.upm.edu.my/id/eprint/34538/
http://psasir.upm.edu.my/id/eprint/34538/
http://psasir.upm.edu.my/id/eprint/34538/
http://psasir.upm.edu.my/id/eprint/34538/1/MOCVD-grown%20indium%20phosphide%20nanowires%20for%20optoelectronics.pdf