Impact of KOH etching on nanostructure fabricated by local anodic oxidation method
In this letter, we investigate the impact of potassium hydroxide (KOH) etching procedure on Silicon nanostructure fabricated by Atomic force microscopy on P-type Silicon-on-insulator. An electrochemical process, as the local anodic oxidation followed by two wet chemical etching steps, KOH etch...
| Main Authors: | , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
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Electrochemical Science Group
2013
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| Online Access: | http://psasir.upm.edu.my/id/eprint/30415/ http://psasir.upm.edu.my/id/eprint/30415/1/Impact%20of%20KOH%20etching%20on%20nanostructure%20fabricated%20by%20local%20anodic%20oxidation%20method.pdf |
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| author | Dehzangi, Arash Larki, Farhad Majlis, Burhanuddin Yeop Naseri, Mahmood Goodarz Navasery, Manizheh Abdullah, A. Makarimi Hutagalung, Sabar D. Abdul Hamid, Norihan Mohd Noor, Mimiwaty Vakilian, Mohammadmahdi Saion, Elias |
| author_facet | Dehzangi, Arash Larki, Farhad Majlis, Burhanuddin Yeop Naseri, Mahmood Goodarz Navasery, Manizheh Abdullah, A. Makarimi Hutagalung, Sabar D. Abdul Hamid, Norihan Mohd Noor, Mimiwaty Vakilian, Mohammadmahdi Saion, Elias |
| author_sort | Dehzangi, Arash |
| building | UPM Institutional Repository |
| collection | Online Access |
| description | In this letter, we investigate the impact of potassium hydroxide (KOH) etching procedure on Silicon
nanostructure fabricated by Atomic force microscopy on P-type Silicon-on-insulator. An
electrochemical process, as the local anodic oxidation followed by two wet chemical etching steps,
KOH etching for silicon removal and hydrofluoric etching for oxide removal, were implemented to
fabricate the silicon nanostructures. The effect of the pure KOH concentrations (10% to 30% wt) on
the quality of the surface is studied. The influence of etching immersing time in etching of
nanostructure and SOI surface are considered as well. Impact of different KOH concentrations mixed
with 10% IPA with reaction temperature on etch rate is investigated. The KOH etching process is
elaborately optimized by 30%wt. KOH + 10%vol. IPA in appropriate time and temperature. The angle
of the walls in etch pit for extracted nanowire reveals some deviation from the standard anisotropic
etching. |
| first_indexed | 2025-11-15T09:06:24Z |
| format | Article |
| id | upm-30415 |
| institution | Universiti Putra Malaysia |
| institution_category | Local University |
| language | English |
| last_indexed | 2025-11-15T09:06:24Z |
| publishDate | 2013 |
| publisher | Electrochemical Science Group |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | upm-304152015-10-07T08:45:08Z http://psasir.upm.edu.my/id/eprint/30415/ Impact of KOH etching on nanostructure fabricated by local anodic oxidation method Dehzangi, Arash Larki, Farhad Majlis, Burhanuddin Yeop Naseri, Mahmood Goodarz Navasery, Manizheh Abdullah, A. Makarimi Hutagalung, Sabar D. Abdul Hamid, Norihan Mohd Noor, Mimiwaty Vakilian, Mohammadmahdi Saion, Elias In this letter, we investigate the impact of potassium hydroxide (KOH) etching procedure on Silicon nanostructure fabricated by Atomic force microscopy on P-type Silicon-on-insulator. An electrochemical process, as the local anodic oxidation followed by two wet chemical etching steps, KOH etching for silicon removal and hydrofluoric etching for oxide removal, were implemented to fabricate the silicon nanostructures. The effect of the pure KOH concentrations (10% to 30% wt) on the quality of the surface is studied. The influence of etching immersing time in etching of nanostructure and SOI surface are considered as well. Impact of different KOH concentrations mixed with 10% IPA with reaction temperature on etch rate is investigated. The KOH etching process is elaborately optimized by 30%wt. KOH + 10%vol. IPA in appropriate time and temperature. The angle of the walls in etch pit for extracted nanowire reveals some deviation from the standard anisotropic etching. Electrochemical Science Group 2013 Article PeerReviewed application/pdf en http://psasir.upm.edu.my/id/eprint/30415/1/Impact%20of%20KOH%20etching%20on%20nanostructure%20fabricated%20by%20local%20anodic%20oxidation%20method.pdf Dehzangi, Arash and Larki, Farhad and Majlis, Burhanuddin Yeop and Naseri, Mahmood Goodarz and Navasery, Manizheh and Abdullah, A. Makarimi and Hutagalung, Sabar D. and Abdul Hamid, Norihan and Mohd Noor, Mimiwaty and Vakilian, Mohammadmahdi and Saion, Elias (2013) Impact of KOH etching on nanostructure fabricated by local anodic oxidation method. International Journal of Electrochemical Science, 8 (6). pp. 8084-8096. ISSN 1452-3981 http://www.electrochemsci.org/list13.htm#issue6 |
| spellingShingle | Dehzangi, Arash Larki, Farhad Majlis, Burhanuddin Yeop Naseri, Mahmood Goodarz Navasery, Manizheh Abdullah, A. Makarimi Hutagalung, Sabar D. Abdul Hamid, Norihan Mohd Noor, Mimiwaty Vakilian, Mohammadmahdi Saion, Elias Impact of KOH etching on nanostructure fabricated by local anodic oxidation method |
| title | Impact of KOH etching on nanostructure fabricated by local
anodic oxidation method |
| title_full | Impact of KOH etching on nanostructure fabricated by local
anodic oxidation method |
| title_fullStr | Impact of KOH etching on nanostructure fabricated by local
anodic oxidation method |
| title_full_unstemmed | Impact of KOH etching on nanostructure fabricated by local
anodic oxidation method |
| title_short | Impact of KOH etching on nanostructure fabricated by local
anodic oxidation method |
| title_sort | impact of koh etching on nanostructure fabricated by local
anodic oxidation method |
| url | http://psasir.upm.edu.my/id/eprint/30415/ http://psasir.upm.edu.my/id/eprint/30415/ http://psasir.upm.edu.my/id/eprint/30415/1/Impact%20of%20KOH%20etching%20on%20nanostructure%20fabricated%20by%20local%20anodic%20oxidation%20method.pdf |