Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication

Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is...

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Main Author: Abd.Wahab, Kader Ibrahim
Format: Thesis
Language:English
English
Published: 2003
Subjects:
Online Access:http://psasir.upm.edu.my/id/eprint/12163/
http://psasir.upm.edu.my/id/eprint/12163/1/FK_2003_22.pdf
_version_ 1848841769825861632
author Abd.Wahab, Kader Ibrahim
author_facet Abd.Wahab, Kader Ibrahim
author_sort Abd.Wahab, Kader Ibrahim
building UPM Institutional Repository
collection Online Access
description Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is done to basically soften the residual liquid boron prior to cleaning for easy removal. This project will cover hardware comparison and recipe proposal that were used. The new consolidated process has resulted in comparable final in-line measurement of oxide thickness and test results. Reliability expectation was also met with 1000 cycles of Intermittent Operating Life test. Significant cost advantages were also achieved.
first_indexed 2025-11-15T07:48:30Z
format Thesis
id upm-12163
institution Universiti Putra Malaysia
institution_category Local University
language English
English
last_indexed 2025-11-15T07:48:30Z
publishDate 2003
recordtype eprints
repository_type Digital Repository
spelling upm-121632024-07-03T07:05:58Z http://psasir.upm.edu.my/id/eprint/12163/ Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication Abd.Wahab, Kader Ibrahim Boron Steam is a process done after boron emitter diffusion for all PNP transistors and diodes. Boron emitter diffusion is a process to dope the emitter well with P-type dopant. The source of this dopant is in the form of liquid spun on the wafers and exposed to high temperatures. Boron steam is done to basically soften the residual liquid boron prior to cleaning for easy removal. This project will cover hardware comparison and recipe proposal that were used. The new consolidated process has resulted in comparable final in-line measurement of oxide thickness and test results. Reliability expectation was also met with 1000 cycles of Intermittent Operating Life test. Significant cost advantages were also achieved. 2003-03 Thesis NonPeerReviewed text en http://psasir.upm.edu.my/id/eprint/12163/1/FK_2003_22.pdf Abd.Wahab, Kader Ibrahim (2003) Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication. Masters thesis, Universiti Putra Malaysia. Boron - Isotopes - Spectra Diffusion Transistor - Effect of radiation English
spellingShingle Boron - Isotopes - Spectra
Diffusion
Transistor - Effect of radiation
Abd.Wahab, Kader Ibrahim
Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_full Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_fullStr Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_full_unstemmed Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_short Process Consolidation Of Boron Steam And Emitter Diffusion In Pnp Bipolar Transistor Fabrication
title_sort process consolidation of boron steam and emitter diffusion in pnp bipolar transistor fabrication
topic Boron - Isotopes - Spectra
Diffusion
Transistor - Effect of radiation
url http://psasir.upm.edu.my/id/eprint/12163/
http://psasir.upm.edu.my/id/eprint/12163/1/FK_2003_22.pdf