Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield
Tweaking RCA (Radio Corporation of America) cleaning process has been the choice of many manufacturers in order to meet the stringent requirement of ITRS (International Technology Roadmap for Semiconductor) as the involvement cost and cycle time is low. It is necessary to understand the interaction...
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| Format: | Thesis |
| Language: | English |
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Universiti Malaysia Sarawak, UNIMAS
2009
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| Online Access: | http://ir.unimas.my/id/eprint/3152/ http://ir.unimas.my/id/eprint/3152/2/Jane%20Chai%20Hai%20Sing%20ft.pdf |
| _version_ | 1848835151450079232 |
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| author | Chai, Jane Hai Sing |
| author_facet | Chai, Jane Hai Sing |
| author_sort | Chai, Jane Hai Sing |
| building | UNIMAS Institutional Repository |
| collection | Online Access |
| description | Tweaking RCA (Radio Corporation of America) cleaning process has been the choice of many manufacturers in order to meet the stringent requirement of ITRS (International Technology Roadmap for Semiconductor) as the involvement cost and cycle time is low. It is necessary to understand the interaction effect of RCA variables in term of particle size and gate oxide quality. In addition, the current cleaning process facing pattern damage issue for smaller geometry integrated circuit. In this thesis, the possibility of using megasonic in QDR (Quick Dump Rinse) is studied. The main objective is to establish optimize cleaning process which able to outperform the standard cleaning with minimum cost. |
| first_indexed | 2025-11-15T06:03:19Z |
| format | Thesis |
| id | unimas-3152 |
| institution | Universiti Malaysia Sarawak |
| institution_category | Local University |
| language | English |
| last_indexed | 2025-11-15T06:03:19Z |
| publishDate | 2009 |
| publisher | Universiti Malaysia Sarawak, UNIMAS |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | unimas-31522025-06-18T04:43:45Z http://ir.unimas.my/id/eprint/3152/ Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield Chai, Jane Hai Sing TD Environmental technology. Sanitary engineering Tweaking RCA (Radio Corporation of America) cleaning process has been the choice of many manufacturers in order to meet the stringent requirement of ITRS (International Technology Roadmap for Semiconductor) as the involvement cost and cycle time is low. It is necessary to understand the interaction effect of RCA variables in term of particle size and gate oxide quality. In addition, the current cleaning process facing pattern damage issue for smaller geometry integrated circuit. In this thesis, the possibility of using megasonic in QDR (Quick Dump Rinse) is studied. The main objective is to establish optimize cleaning process which able to outperform the standard cleaning with minimum cost. Universiti Malaysia Sarawak, UNIMAS 2009 Thesis NonPeerReviewed text en http://ir.unimas.my/id/eprint/3152/2/Jane%20Chai%20Hai%20Sing%20ft.pdf Chai, Jane Hai Sing (2009) Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield. Masters thesis, Universiti Malaysia Sarawak (UNIMAS). |
| spellingShingle | TD Environmental technology. Sanitary engineering Chai, Jane Hai Sing Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield |
| title | Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield |
| title_full | Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield |
| title_fullStr | Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield |
| title_full_unstemmed | Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield |
| title_short | Interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield |
| title_sort | interaction effect of rca dilution, temperature and megasonic on particle removal efficiency, gate oxide quality, defect density and yield |
| topic | TD Environmental technology. Sanitary engineering |
| url | http://ir.unimas.my/id/eprint/3152/ http://ir.unimas.my/id/eprint/3152/2/Jane%20Chai%20Hai%20Sing%20ft.pdf |