Stability of Chlorine Termination on Ge(100) and Ge(111) Surfaces
The different cleaning solution; HCl and HF solution are used to remove the suboxide and oxide component on Ge surface. The HCl cleaning results chlorine (Cl) termination on Ge surface whereas no Fluorine (F) termination was observed just after HF cleaning. The growth of Ge oxide is studied after t...
| Main Authors: | , , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
EDP Sciences
2017
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| Subjects: | |
| Online Access: | http://ir.unimas.my/id/eprint/17378/ http://ir.unimas.my/id/eprint/17378/1/Nik%20Amni.pdf |
| Summary: | The different cleaning solution; HCl and HF solution are used to remove the suboxide and oxide component on Ge
surface. The HCl cleaning results chlorine (Cl) termination on Ge surface whereas no Fluorine (F) termination was observed just after HF cleaning. The growth of Ge oxide is studied after treated with HCl cleaning on two surface orientations; (100) and (111),
respectively in dry oxygen ambient and cleanroom air by spectroscopic ellipsometry (SE) and x-ray photoelectron spectroscopy (XPS). A clear step and terrace trend was observed for the oxidation growth of Ge (100) and Ge (111) in dry oxygen ambient
compared to in clean room air. This trend shows the difference in surface reaction of Ge oxidation as humidity varies. The stability
of chlorine termination of Ge (111) than Ge (100) explains the slower growth of oxidation in dry oxygen ambient. |
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