Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography

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Lifetime Prolongation of Release Agent on Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography

Release agent becomes an imperative element in ultraviolet nanoimprint lithography (UV-NIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates a strong rel...

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Bibliographic Details
Main Authors:	Nurhafizah, Abu Talip, Hayashi, Tatsuya, Tanighuchi, Jun, Hiwasa, Shin
Format:	Conference or Workshop Item
Language:	English
Published:	2015
Subjects:	TK Electrical engineering. Electronics Nuclear engineering
Online Access:	http://umpir.ump.edu.my/id/eprint/9274/ http://umpir.ump.edu.my/id/eprint/9274/1/fkee-2015-nurhafizah-Lifetime%20prolongation%281%29.pdf

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