Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography

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Lifetime Amelioration of Antireflection Structure Molds by Means of Partial-filling Ultraviolet Nanoimprint Lithography

Release coating layer (RCL) becomes an important element in ultraviolet nanoimprint lithography (UVNIL) for preventing the adhesive resin from adhering to the surface of antireflection structures (ARS) mold. However, complete filling the resin of a high-aspect-ratio ARS mold during UV-NIL generates...

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Bibliographic Details
Main Authors:	Nurhafizah, Abu Talip, Hayashi, Tatsuya, Taniguchi, Jun, Hiwasa, Shin
Format:	Article
Language:	English
Published:	Elsevier Ltd 2015
Subjects:	TK Electrical engineering. Electronics Nuclear engineering
Online Access:	http://umpir.ump.edu.my/id/eprint/8811/ http://umpir.ump.edu.my/id/eprint/8811/1/fkee-2015-Nurhafizah-Lifetime%20Amelioration-abs.pdf

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