Optimization of UV-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology

Commercial nanofiltration polyethersulfone (NF2) membrane was modified via ultraviolet (UV) photografting to prepare a high-performance forward osmosis (FO) membrane. The optimized condition of grafting parameters was obtained using central composite design (CCD) and response surface methodology (RS...

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Main Authors: Abdul Rahman, Ahmad Fikri Hadi, Ahmad Khushairi, Zulsyazwan, Abu Seman, M. N., Mohamed, Khayet
Format: Article
Language:English
English
Published: Springer 2021
Subjects:
Online Access:http://umpir.ump.edu.my/id/eprint/33750/
http://umpir.ump.edu.my/id/eprint/33750/1/KJCE%2038%2811%29%282021%29%202313.pdf
http://umpir.ump.edu.my/id/eprint/33750/7/Optimization%20of%20UV-photografting%20factors%20in%20preparation%20of%20polyacrylic.pdf
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author Abdul Rahman, Ahmad Fikri Hadi
Ahmad Khushairi, Zulsyazwan
Abu Seman, M. N.
Mohamed, Khayet
author_facet Abdul Rahman, Ahmad Fikri Hadi
Ahmad Khushairi, Zulsyazwan
Abu Seman, M. N.
Mohamed, Khayet
author_sort Abdul Rahman, Ahmad Fikri Hadi
building UMP Institutional Repository
collection Online Access
description Commercial nanofiltration polyethersulfone (NF2) membrane was modified via ultraviolet (UV) photografting to prepare a high-performance forward osmosis (FO) membrane. The optimized condition of grafting parameters was obtained using central composite design (CCD) and response surface methodology (RSM). UV-photografting time and acrylic acid (AA) monomer concentration were the considered variables, while the two RSM responses were water permeate flux and reverse salt diffusion flux (RSD). Quadratic models were established between the responses and the independent parameters using analysis of variance (ANOVA). The membranes were characterized with functional group, morphology and surface roughness. The obtained optimum conditions were 2.81min grafting time and 27.85g/L AA monomer concentration. Under these conditions, a maximum water permeate flux of 1.52±0.04L/m2·h was achieved with an RSD value of 10.09±0.36g/m2·h. The optimized membrane exhibited a higher water flux compared to the unmodified NF2 membrane without any significant change of the RSD value.
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spelling ump-337502022-07-28T01:34:52Z http://umpir.ump.edu.my/id/eprint/33750/ Optimization of UV-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology Abdul Rahman, Ahmad Fikri Hadi Ahmad Khushairi, Zulsyazwan Abu Seman, M. N. Mohamed, Khayet TA Engineering (General). Civil engineering (General) TP Chemical technology Commercial nanofiltration polyethersulfone (NF2) membrane was modified via ultraviolet (UV) photografting to prepare a high-performance forward osmosis (FO) membrane. The optimized condition of grafting parameters was obtained using central composite design (CCD) and response surface methodology (RSM). UV-photografting time and acrylic acid (AA) monomer concentration were the considered variables, while the two RSM responses were water permeate flux and reverse salt diffusion flux (RSD). Quadratic models were established between the responses and the independent parameters using analysis of variance (ANOVA). The membranes were characterized with functional group, morphology and surface roughness. The obtained optimum conditions were 2.81min grafting time and 27.85g/L AA monomer concentration. Under these conditions, a maximum water permeate flux of 1.52±0.04L/m2·h was achieved with an RSD value of 10.09±0.36g/m2·h. The optimized membrane exhibited a higher water flux compared to the unmodified NF2 membrane without any significant change of the RSD value. Springer 2021-09-09 Article PeerReviewed pdf en http://umpir.ump.edu.my/id/eprint/33750/1/KJCE%2038%2811%29%282021%29%202313.pdf pdf en http://umpir.ump.edu.my/id/eprint/33750/7/Optimization%20of%20UV-photografting%20factors%20in%20preparation%20of%20polyacrylic.pdf Abdul Rahman, Ahmad Fikri Hadi and Ahmad Khushairi, Zulsyazwan and Abu Seman, M. N. and Mohamed, Khayet (2021) Optimization of UV-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology. Korean Journal of Chemical Engineering, 38 (11). pp. 2313-2323. ISSN 0256-1115 (Print); 1975-7220 (Online). (Published) https://doi.org/10.1007/s11814-021-0881-6 https://doi.org/10.1007/s11814-021-0881-6
spellingShingle TA Engineering (General). Civil engineering (General)
TP Chemical technology
Abdul Rahman, Ahmad Fikri Hadi
Ahmad Khushairi, Zulsyazwan
Abu Seman, M. N.
Mohamed, Khayet
Optimization of UV-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology
title Optimization of UV-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology
title_full Optimization of UV-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology
title_fullStr Optimization of UV-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology
title_full_unstemmed Optimization of UV-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology
title_short Optimization of UV-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology
title_sort optimization of uv-photografting factors in preparation of polyacrylic-polyethersulfone forward osmosis membrane using response surface methodology
topic TA Engineering (General). Civil engineering (General)
TP Chemical technology
url http://umpir.ump.edu.my/id/eprint/33750/
http://umpir.ump.edu.my/id/eprint/33750/
http://umpir.ump.edu.my/id/eprint/33750/
http://umpir.ump.edu.my/id/eprint/33750/1/KJCE%2038%2811%29%282021%29%202313.pdf
http://umpir.ump.edu.my/id/eprint/33750/7/Optimization%20of%20UV-photografting%20factors%20in%20preparation%20of%20polyacrylic.pdf