Temperature Impact on The ION/IOFF Ratio of Gate All Around Nanowire TFET

This research paper presents the effect of working temperature on the ION, IOFF and ION/IOFF ratio of gate all around nanowire TFET. The (Silvaco) simulation tool has been used to investigate the temperature characteristics of a transistor. The working temperature range of this study is from -5...

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Main Authors: Agha, Firas Natheer Abdul-kadir, Hashim, Yasir, Shakib, Mohammed Nazmus
Format: Conference or Workshop Item
Language:English
Published: IEEE Xplore 2020
Subjects:
Online Access:http://umpir.ump.edu.my/id/eprint/30155/
http://umpir.ump.edu.my/id/eprint/30155/1/09166887.pdf
_version_ 1848823444584529920
author Agha, Firas Natheer Abdul-kadir
Hashim, Yasir
Shakib, Mohammed Nazmus
author_facet Agha, Firas Natheer Abdul-kadir
Hashim, Yasir
Shakib, Mohammed Nazmus
author_sort Agha, Firas Natheer Abdul-kadir
building UMP Institutional Repository
collection Online Access
description This research paper presents the effect of working temperature on the ION, IOFF and ION/IOFF ratio of gate all around nanowire TFET. The (Silvaco) simulation tool has been used to investigate the temperature characteristics of a transistor. The working temperature range of this study is from -50 to 150 step-up 25 oC. The final results indicate that the negative effects of increasing working temperature of gate all around nanowire TFET due to decreasing of the ION/IOFF ratio. Hence, the results for ION/IOFF ratio vs. working temperature characteristics may lead to the use of TFET in electronic circuits with lowest possible working temperature to obtain higher ION/IOFF ratio.
first_indexed 2025-11-15T02:57:14Z
format Conference or Workshop Item
id ump-30155
institution Universiti Malaysia Pahang
institution_category Local University
language English
last_indexed 2025-11-15T02:57:14Z
publishDate 2020
publisher IEEE Xplore
recordtype eprints
repository_type Digital Repository
spelling ump-301552020-12-10T08:09:59Z http://umpir.ump.edu.my/id/eprint/30155/ Temperature Impact on The ION/IOFF Ratio of Gate All Around Nanowire TFET Agha, Firas Natheer Abdul-kadir Hashim, Yasir Shakib, Mohammed Nazmus TK Electrical engineering. Electronics Nuclear engineering This research paper presents the effect of working temperature on the ION, IOFF and ION/IOFF ratio of gate all around nanowire TFET. The (Silvaco) simulation tool has been used to investigate the temperature characteristics of a transistor. The working temperature range of this study is from -50 to 150 step-up 25 oC. The final results indicate that the negative effects of increasing working temperature of gate all around nanowire TFET due to decreasing of the ION/IOFF ratio. Hence, the results for ION/IOFF ratio vs. working temperature characteristics may lead to the use of TFET in electronic circuits with lowest possible working temperature to obtain higher ION/IOFF ratio. IEEE Xplore 2020-07 Conference or Workshop Item PeerReviewed pdf en http://umpir.ump.edu.my/id/eprint/30155/1/09166887.pdf Agha, Firas Natheer Abdul-kadir and Hashim, Yasir and Shakib, Mohammed Nazmus (2020) Temperature Impact on The ION/IOFF Ratio of Gate All Around Nanowire TFET. In: IEEE International Conference on Semiconductor Electronics (ICSE) , 28-29 July, 2020 , Kuala Lumpur, Malaysia. pp. 1-4.. ISBN 978-1-7281-5968-3 (Published) https://ieeexplore.ieee.org/document/9166887
spellingShingle TK Electrical engineering. Electronics Nuclear engineering
Agha, Firas Natheer Abdul-kadir
Hashim, Yasir
Shakib, Mohammed Nazmus
Temperature Impact on The ION/IOFF Ratio of Gate All Around Nanowire TFET
title Temperature Impact on The ION/IOFF Ratio of Gate All Around Nanowire TFET
title_full Temperature Impact on The ION/IOFF Ratio of Gate All Around Nanowire TFET
title_fullStr Temperature Impact on The ION/IOFF Ratio of Gate All Around Nanowire TFET
title_full_unstemmed Temperature Impact on The ION/IOFF Ratio of Gate All Around Nanowire TFET
title_short Temperature Impact on The ION/IOFF Ratio of Gate All Around Nanowire TFET
title_sort temperature impact on the ion/ioff ratio of gate all around nanowire tfet
topic TK Electrical engineering. Electronics Nuclear engineering
url http://umpir.ump.edu.my/id/eprint/30155/
http://umpir.ump.edu.my/id/eprint/30155/
http://umpir.ump.edu.my/id/eprint/30155/1/09166887.pdf