Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography

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Lifetime Amelioration of Release-Agent-Free Antireflection-Structured Replica Molds by Partial-Filling Ultraviolet Nanoimprint Lithography

In ultraviolet nanoimprint lithography (UV-NIL), the presence of fluorinated components in a release-agent-free antireflection-structured (RAF-ARS) replica mold is an important factor preventing the adhesion of resin on its surface. Nevertheless, a strong release force (RF), which results from the c...

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Bibliographic Details
Main Authors:	Nurhafizah, Abu Talip, Hayashi, Tatsuya, Taniguchi, Jun, Hiwasa, Shin
Format:	Article
Published:	IOP Publishing 2015
Subjects:	TK Electrical engineering. Electronics Nuclear engineering
Online Access:	http://umpir.ump.edu.my/id/eprint/11884/

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