Hybrid plasma enhanced chemical vapour deposition/sputtering system for preparation of luminescent silicon carbon films / Nur Maisarah binti Abdul Rashid

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Hybrid plasma enhanced chemical vapour deposition/sputtering system for preparation of luminescent silicon carbon films / Nur Maisarah binti Abdul Rashid

Radio frequency plasma enhanced chemical vapour deposition (r.f PECVD) process is a well-established technique for depositing amorphous silicon carbon (a-SiC) films. However, an environmental friendly deposition technique which does not involve the use of toxic gas, silane (SiH4) is a much preferred...

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Bibliographic Details
Main Author:	Abdul Rashid, Nur Maisarah
Format:	Thesis
Published:	2013
Subjects:	Q Science (General) QC Physics
Online Access:	http://studentsrepo.um.edu.my/4414/ http://studentsrepo.um.edu.my/4414/1/THESIS_MSc_NUR_MAISARAH_BINTI_ABDUL_RASHID_SGR090108.pdf

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