Plasma enhanced chemical vapour deposition of carbon nitride films from ethane and nitrogen gas mixtures / Maisara binti Othman

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Plasma enhanced chemical vapour deposition of carbon nitride films from ethane and nitrogen gas mixtures / Maisara binti Othman

The fabrication and characterization of amorphous carbon nitride a-CNx thin films are intensively studied in this work. These films were obtained using radio frequency (rf) plasma enhanced chemical vapour deposition. In the first part of this work, a-CNx films were deposited either from methane and...

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Bibliographic Details
Main Author:	Othman, Maisara
Format:	Thesis
Published:	2012
Subjects:	Q Science (General) QC Physics
Online Access:	http://studentsrepo.um.edu.my/4346/ http://studentsrepo.um.edu.my/4346/1/Thesis_final_PDF%2DMaisaraOthman.pdf

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