Optimization of inductively coupled plasma dry etching for planar waveguide fabrication / Lim Weng Hong

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Optimization of inductively coupled plasma dry etching for planar waveguide fabrication / Lim Weng Hong

Optimization of the Inductively Coupled Plasma (ICP) dry etching process parameters has been carried out. Seven main etching characteristics were considered in order to produce good etching quality. These characteristics are glass etching rates, selectivity of chromium to glass etching rate, channel...

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Bibliographic Details
Main Author:	Lim, Weng Hong
Format:	Thesis
Published:	2010
Subjects:	Q Science (General) QC Physics
Online Access:	http://pendeta.um.edu.my/client/default/search/detailnonmodal/ent:$002f$002fSD_ILS$002f796$002fSD_ILS:796323/one?qu=Optimization+of+inductively+coupled+plasma+dry+etching http://studentsrepo.um.edu.my/4307/1/lim_weng_hong.pdf

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