Characterization of fluorine upon implant sequence on p-metal oxide semiconductor (PMOS) and P+/N-Junction schottky diode in BiCMOS technology / Siti Zubaidah Md Saad

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Characterization of fluorine upon implant sequence on p-metal oxide semiconductor (PMOS) and P+/N-Junction schottky diode in BiCMOS technology / Siti Zubaidah Md Saad

Fluorine (F) is known as a reactive species that capable to form a variety of complex defects. It beneficial effect as well as the detrimental effect to the electrical and physical characterization of devices have been studied by many researchers. The effect of F to the electrical results such as re...

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Bibliographic Details
Main Author:	Md Saad, Siti Zubaidah
Format:	Thesis
Language:	English
Published:	2014
Subjects:	Fluorine Metal oxide semiconductors
Online Access:	https://ir.uitm.edu.my/id/eprint/12039/

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