Choline Chloride: Urea-based deep eutectic solvent as additive to proton conducting chitosan films

Chitosan (CS) film has been regarded as one of the bioresources that shows its ability to conduct proton upon modification. Nonetheless, CS film in nature is brittle and shows extremely high swelling degree towards water, leading to the impractical applications for fuel cell membranes and batteries....

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Main Authors: Wong, W. Y., Wong, C. Y., Walvekar, Rashmi, Khalid, Mohammad *
Format: Article
Language:English
Published: School of Engineering, Taylor's University 2018
Subjects:
Online Access:http://eprints.sunway.edu.my/960/
http://eprints.sunway.edu.my/960/1/M%20Khalid%20CHOLINE%20CHLORIDE-UREA-BASED%20DEEP%20EUTECTIC%20SOLVENT%20AS%20ADDITIVE%20TO%20PROTON%20CONDUCTING%20CHITOSAN%20FILMS.pdf
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author Wong, W. Y.
Wong, C. Y.
Walvekar, Rashmi
Khalid, Mohammad *
author_facet Wong, W. Y.
Wong, C. Y.
Walvekar, Rashmi
Khalid, Mohammad *
author_sort Wong, W. Y.
building SU Institutional Repository
collection Online Access
description Chitosan (CS) film has been regarded as one of the bioresources that shows its ability to conduct proton upon modification. Nonetheless, CS film in nature is brittle and shows extremely high swelling degree towards water, leading to the impractical applications for fuel cell membranes and batteries. Formation of natural polymeric film requires plasticiser to crosslink natural polymers in improving the mechanical strength. Here, we investigate the potential of choline chloride (ChCl) and urea based deep eutectic solvent (DES) as additive in CS film with the aim to improve the mechanical property of the film. In this study, ChCl:urea- based DES was mixed with pure CS solution at different volume ratio and casted into a film. The film will be investigated on the functional groups, water uptake, ionic conductivity, proton exchange capacity and its morphology. Based on the SEM morphology result, it was found that addition of DES improves the homogeneity of the membrane film mainly attributed to the presence of strong bonds between the CS monosaccharides. Besides that, it also contributed towards better plasticising effect of the film that improves the flexibility of the membrane. The addition of DES has further improved the ionic conductivity of CS film from 2.98×10-3 to 1.23×10-2 S/cm; while drastically reduced the water uptake from 698.89 % to 180.67 %.
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spelling sunway-9602019-04-25T07:46:18Z http://eprints.sunway.edu.my/960/ Choline Chloride: Urea-based deep eutectic solvent as additive to proton conducting chitosan films Wong, W. Y. Wong, C. Y. Walvekar, Rashmi Khalid, Mohammad * QC Physics Chitosan (CS) film has been regarded as one of the bioresources that shows its ability to conduct proton upon modification. Nonetheless, CS film in nature is brittle and shows extremely high swelling degree towards water, leading to the impractical applications for fuel cell membranes and batteries. Formation of natural polymeric film requires plasticiser to crosslink natural polymers in improving the mechanical strength. Here, we investigate the potential of choline chloride (ChCl) and urea based deep eutectic solvent (DES) as additive in CS film with the aim to improve the mechanical property of the film. In this study, ChCl:urea- based DES was mixed with pure CS solution at different volume ratio and casted into a film. The film will be investigated on the functional groups, water uptake, ionic conductivity, proton exchange capacity and its morphology. Based on the SEM morphology result, it was found that addition of DES improves the homogeneity of the membrane film mainly attributed to the presence of strong bonds between the CS monosaccharides. Besides that, it also contributed towards better plasticising effect of the film that improves the flexibility of the membrane. The addition of DES has further improved the ionic conductivity of CS film from 2.98×10-3 to 1.23×10-2 S/cm; while drastically reduced the water uptake from 698.89 % to 180.67 %. School of Engineering, Taylor's University 2018 Article PeerReviewed text en cc_by_nc_4 http://eprints.sunway.edu.my/960/1/M%20Khalid%20CHOLINE%20CHLORIDE-UREA-BASED%20DEEP%20EUTECTIC%20SOLVENT%20AS%20ADDITIVE%20TO%20PROTON%20CONDUCTING%20CHITOSAN%20FILMS.pdf Wong, W. Y. and Wong, C. Y. and Walvekar, Rashmi and Khalid, Mohammad * (2018) Choline Chloride: Urea-based deep eutectic solvent as additive to proton conducting chitosan films. Journal of Engineering Science and Technology, 13 (2). pp. 2995-3006. ISSN 2995-3006
spellingShingle QC Physics
Wong, W. Y.
Wong, C. Y.
Walvekar, Rashmi
Khalid, Mohammad *
Choline Chloride: Urea-based deep eutectic solvent as additive to proton conducting chitosan films
title Choline Chloride: Urea-based deep eutectic solvent as additive to proton conducting chitosan films
title_full Choline Chloride: Urea-based deep eutectic solvent as additive to proton conducting chitosan films
title_fullStr Choline Chloride: Urea-based deep eutectic solvent as additive to proton conducting chitosan films
title_full_unstemmed Choline Chloride: Urea-based deep eutectic solvent as additive to proton conducting chitosan films
title_short Choline Chloride: Urea-based deep eutectic solvent as additive to proton conducting chitosan films
title_sort choline chloride: urea-based deep eutectic solvent as additive to proton conducting chitosan films
topic QC Physics
url http://eprints.sunway.edu.my/960/
http://eprints.sunway.edu.my/960/1/M%20Khalid%20CHOLINE%20CHLORIDE-UREA-BASED%20DEEP%20EUTECTIC%20SOLVENT%20AS%20ADDITIVE%20TO%20PROTON%20CONDUCTING%20CHITOSAN%20FILMS.pdf