A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist
Current lithographic resists depend on large polymeric materials, which are starting to limit further improvements in line-width roughness and feature size. Fullerene molecular resists use much smaller molecules to avoid this problem. However, such resists have poor radiation sensitivity. Chemical a...
| Main Authors: | , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
2007
|
| Subjects: | |
| Online Access: | http://scholars.utp.edu.my/id/eprint/886/ http://scholars.utp.edu.my/id/eprint/886/1/Small_2007.PDF |
| _version_ | 1848659053380632576 |
|---|---|
| author | Gibbons, Francis Mohd Zaid, Hasnah Robinson, A.P.G. |
| author_facet | Gibbons, Francis Mohd Zaid, Hasnah Robinson, A.P.G. |
| author_sort | Gibbons, Francis |
| building | UTP Institutional Repository |
| collection | Online Access |
| description | Current lithographic resists depend on large polymeric materials, which are starting to limit further improvements in line-width roughness and feature size. Fullerene molecular resists use much smaller molecules to avoid this problem. However, such resists have poor radiation sensitivity. Chemical amplification of a fullerene derivative using an epoxy crosslinker and a photoacid generator is demonstrated. The sensitivity of the material is increased by two orders of magnitude, and 20-nm line widths are patterned. |
| first_indexed | 2025-11-13T07:24:18Z |
| format | Article |
| id | oai:scholars.utp.edu.my:886 |
| institution | Universiti Teknologi Petronas |
| institution_category | Local University |
| language | English |
| last_indexed | 2025-11-13T07:24:18Z |
| publishDate | 2007 |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | oai:scholars.utp.edu.my:8862017-01-19T08:26:51Z http://scholars.utp.edu.my/id/eprint/886/ A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist Gibbons, Francis Mohd Zaid, Hasnah Robinson, A.P.G. QC Physics Current lithographic resists depend on large polymeric materials, which are starting to limit further improvements in line-width roughness and feature size. Fullerene molecular resists use much smaller molecules to avoid this problem. However, such resists have poor radiation sensitivity. Chemical amplification of a fullerene derivative using an epoxy crosslinker and a photoacid generator is demonstrated. The sensitivity of the material is increased by two orders of magnitude, and 20-nm line widths are patterned. 2007-11-15 Article PeerReviewed application/pdf en http://scholars.utp.edu.my/id/eprint/886/1/Small_2007.PDF Gibbons, Francis and Mohd Zaid, Hasnah and Robinson, A.P.G. (2007) A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist. Small, 3 (12). pp. 2076-2080. 10.1002/smll.200700324 10.1002/smll.200700324 |
| spellingShingle | QC Physics Gibbons, Francis Mohd Zaid, Hasnah Robinson, A.P.G. A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist |
| title | A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist |
| title_full | A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist |
| title_fullStr | A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist |
| title_full_unstemmed | A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist |
| title_short | A Chemically Amplified Fullerene-Derivative Molecular Electron-Beam Resist |
| title_sort | chemically amplified fullerene-derivative molecular electron-beam resist |
| topic | QC Physics |
| url | http://scholars.utp.edu.my/id/eprint/886/ http://scholars.utp.edu.my/id/eprint/886/ http://scholars.utp.edu.my/id/eprint/886/1/Small_2007.PDF |