Anomalous acid diffusion in a triphenylene molecular resist with melamine crosslinker

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Anomalous acid diffusion in a triphenylene molecular resist with melamine crosslinker

Next generation lithography will require next generation resists. Molecular resists, based on small nonpolymeric molecules, promise improvements in line width roughness and resolution control for high resolution lithographic patterns. However, these materials are generally not sensitive enough for...

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Bibliographic Details
Main Author:	Mohd Zaid, Hasnah
Format:	Article
Language:	English
Published:	2008
Subjects:	QC Physics
Online Access:	http://scholars.utp.edu.my/id/eprint/883/ http://scholars.utp.edu.my/id/eprint/883/1/anomalous_acid_sciencedirect_2008.pdf

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