Robinson, A., & Mohd Zaid, H. (2006). Chemically amplified molecular resists for electron beam lithography.
Chicago Style (17th ed.) CitationRobinson, A.P.G, and Hasnah Mohd Zaid. Chemically Amplified Molecular Resists for Electron Beam Lithography. 2006.
MLA (9th ed.) CitationRobinson, A.P.G, and Hasnah Mohd Zaid. Chemically Amplified Molecular Resists for Electron Beam Lithography. 2006.
Warning: These citations may not always be 100% accurate.