Nanoscale patterning by AFM lithography and its application
on the fabrication of silicon nanowire devices

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Nanoscale patterning by AFM lithography and its application on the fabrication of silicon nanowire devices

Many techniques have been applied to fabricate nanostructures via top-down approach such as electron beam lithography. However, most of the techniques are very complicated and involves many process steps, high cost operation as well as the use of hazardous chemicals. Meanwhile, atomic force microsco...

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Bibliographic Details
Main Authors:	Sabar D. Hutagalung, Kam, Chung Lew, Darsono, Teguh
Format:	Article
Language:	English
Published:	Universiti Kebangsaan Malaysia 2014
Online Access:	http://journalarticle.ukm.my/6857/ http://journalarticle.ukm.my/6857/1/15_Sabar_D._Hutagalung.pdf

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