Optimization of titanium silicide formation on boron doped silicon using statistical design

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Optimization of titanium silicide formation on boron doped silicon using statistical design

The effects of first heat treatment temperature, second heat treatment temperature and second heat treatment time on titanium films by measuring the sheet resistance was investigated using statistical design of experiment. Two-level screening experiment with 23 factorial design was used to evaluate...

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Bibliographic Details
Main Authors:	Uda Hashim, Abu Hassan Shaari, Burhanudin Yeop Majlis, Sahbudin Shaari
Format:	Article
Published:	Universiti Kebangsaan Malaysia 2000
Online Access:	http://journalarticle.ukm.my/3790/

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