G-Centre formation and behaviour in a silicon on insulator platform by carbon ion implantation and Proton irradiation
The interest in the G-centre is driven by reports that it can lase in silicon. To further this, the transfer of this technology from bulk silicon to a silicon-on-insulator (SOI) platform is an essential requirement to progress to lasing and optical amplification on silicon. We report on the efficien...
| Main Authors: | D.D. Berhanuddin, N.E.A. Razak, Lourenço, M.A., B.Y. Majlis, Homewood, K.P. |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Penerbit Universiti Kebangsaan Malaysia
2019
|
| Online Access: | http://journalarticle.ukm.my/13717/ http://journalarticle.ukm.my/13717/1/12%20D.D.%20Berhanuddin.pdf |
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