TEM assessment of As-doped GaN epitaxial layers grown on sapphire

TEM investigations of As-doped GaN layers grown by plasma-assisted molecular beam epitaxy on sapphire substrates reveal the presence of extensive regions of cubic stacking disorder within the hexagonal GaN matrix. Electron energy loss spectroscopy suggests the localization of As within grains immedi...

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Main Authors: Fay, Mike W., Harrison, Ian, Larkins, Eric C., Novikov, Sergei V., Foxon, C.T., Brown, Paul D.
Other Authors: McVitie, Stephen
Format: Book Section
Published: Institute of Physics Publishing 2004
Subjects:
Online Access:https://eprints.nottingham.ac.uk/1442/
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author Fay, Mike W.
Harrison, Ian
Larkins, Eric C.
Novikov, Sergei V.
Foxon, C.T.
Brown, Paul D.
author2 McVitie, Stephen
author_facet McVitie, Stephen
Fay, Mike W.
Harrison, Ian
Larkins, Eric C.
Novikov, Sergei V.
Foxon, C.T.
Brown, Paul D.
author_sort Fay, Mike W.
building Nottingham Research Data Repository
collection Online Access
description TEM investigations of As-doped GaN layers grown by plasma-assisted molecular beam epitaxy on sapphire substrates reveal the presence of extensive regions of cubic stacking disorder within the hexagonal GaN matrix. Electron energy loss spectroscopy suggests the localization of As within grains immediately below domains containing stacking disorder, and additionally at the layer surface. This suggests that localised strain plays a role in the formation mechanism of the stacking faults.
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format Book Section
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institution University of Nottingham Malaysia Campus
institution_category Local University
last_indexed 2025-11-14T18:15:17Z
publishDate 2004
publisher Institute of Physics Publishing
recordtype eprints
repository_type Digital Repository
spelling nottingham-14422020-05-04T20:31:28Z https://eprints.nottingham.ac.uk/1442/ TEM assessment of As-doped GaN epitaxial layers grown on sapphire Fay, Mike W. Harrison, Ian Larkins, Eric C. Novikov, Sergei V. Foxon, C.T. Brown, Paul D. TEM investigations of As-doped GaN layers grown by plasma-assisted molecular beam epitaxy on sapphire substrates reveal the presence of extensive regions of cubic stacking disorder within the hexagonal GaN matrix. Electron energy loss spectroscopy suggests the localization of As within grains immediately below domains containing stacking disorder, and additionally at the layer surface. This suggests that localised strain plays a role in the formation mechanism of the stacking faults. Institute of Physics Publishing McVitie, Stephen McComb, David 2004 Book Section PeerReviewed Fay, Mike W., Harrison, Ian, Larkins, Eric C., Novikov, Sergei V., Foxon, C.T. and Brown, Paul D. (2004) TEM assessment of As-doped GaN epitaxial layers grown on sapphire. In: Electron Microscopy and Analysis 2003: Proceedings of the Institute of Physics Electron Microscopy and Analysis Group Conference, University of Oxford, 3-5 September 2003. Institute of Physics conference series (179). Institute of Physics Publishing, Bristol, pp. 23-26. ISBN 0750309679 EELS TEM GaN Epitaxy Doping PAMBE
spellingShingle EELS TEM GaN Epitaxy Doping PAMBE
Fay, Mike W.
Harrison, Ian
Larkins, Eric C.
Novikov, Sergei V.
Foxon, C.T.
Brown, Paul D.
TEM assessment of As-doped GaN epitaxial layers grown on sapphire
title TEM assessment of As-doped GaN epitaxial layers grown on sapphire
title_full TEM assessment of As-doped GaN epitaxial layers grown on sapphire
title_fullStr TEM assessment of As-doped GaN epitaxial layers grown on sapphire
title_full_unstemmed TEM assessment of As-doped GaN epitaxial layers grown on sapphire
title_short TEM assessment of As-doped GaN epitaxial layers grown on sapphire
title_sort tem assessment of as-doped gan epitaxial layers grown on sapphire
topic EELS TEM GaN Epitaxy Doping PAMBE
url https://eprints.nottingham.ac.uk/1442/