Lee, B. G. (2004). Computer Simulations Of Void And Oxide Precipitate In Hydrogen-Annealed Silicon Wafer.
Chicago Style (17th ed.) CitationLee, Beng Gee. Computer Simulations Of Void And Oxide Precipitate In Hydrogen-Annealed Silicon Wafer. 2004.
MLA (9th ed.) CitationLee, Beng Gee. Computer Simulations Of Void And Oxide Precipitate In Hydrogen-Annealed Silicon Wafer. 2004.
Warning: These citations may not always be 100% accurate.