Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices
High spped performance in VLSI devices requires the use of semiconductor materials such as copper interconnects and low-k dielectric. Low-k dielectric can reduce the parasitic capacitance between two metal lines, which allows higher operational speed as compared to silicon oxide.
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| Format: | Thesis |
| Published: |
2006
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| Online Access: | http://shdl.mmu.edu.my/1124/ |
| _version_ | 1848789699690233856 |
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| author | Wong, Man On |
| author_facet | Wong, Man On |
| author_sort | Wong, Man On |
| building | MMU Institutional Repository |
| collection | Online Access |
| description | High spped performance in VLSI devices requires the use of semiconductor materials such as copper interconnects and low-k dielectric. Low-k dielectric can reduce the parasitic capacitance between two metal lines, which allows higher operational speed as compared to silicon oxide. |
| first_indexed | 2025-11-14T18:00:52Z |
| format | Thesis |
| id | mmu-1124 |
| institution | Multimedia University |
| institution_category | Local University |
| last_indexed | 2025-11-14T18:00:52Z |
| publishDate | 2006 |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | mmu-11242010-08-23T03:47:22Z http://shdl.mmu.edu.my/1124/ Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices Wong, Man On TK7800-8360 Electronics High spped performance in VLSI devices requires the use of semiconductor materials such as copper interconnects and low-k dielectric. Low-k dielectric can reduce the parasitic capacitance between two metal lines, which allows higher operational speed as compared to silicon oxide. 2006-05 Thesis NonPeerReviewed Wong, Man On (2006) Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices. Masters thesis, Multimedia University. http://myto.perpun.net.my/metoalogin/logina.php |
| spellingShingle | TK7800-8360 Electronics Wong, Man On Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices |
| title | Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices |
| title_full | Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices |
| title_fullStr | Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices |
| title_full_unstemmed | Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices |
| title_short | Study Of MSQ As Low-K Dielectric Material For Semiconductor Devices |
| title_sort | study of msq as low-k dielectric material for semiconductor devices |
| topic | TK7800-8360 Electronics |
| url | http://shdl.mmu.edu.my/1124/ http://shdl.mmu.edu.my/1124/ |