Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite
This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots...
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| Format: | Article |
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Trans Tech Publications
2016
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| Online Access: | http://eprints.intimal.edu.my/980/ |
| _version_ | 1848766615232970752 |
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| author | Low, Andrew Chun Wey Damideh, Vahid* Saw, S. H. Lim, Chin Seong* |
| author_facet | Low, Andrew Chun Wey Damideh, Vahid* Saw, S. H. Lim, Chin Seong* |
| author_sort | Low, Andrew Chun Wey |
| building | INTI Institutional Repository |
| collection | Online Access |
| description | This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots while the second test was carried out using 1 focus shot at 2, 3, 4, 5 and 7 Torr. Both tests were conducted with neon as filling gas at 7 Torr at distance of 8cm from the anode tip. In the first test, FESEM images exhibit a non-homogenous, non-uniformed and largely agglomerated carbon deposition at all films as pressure of filling gas increases. The EDX mapping confirms that carbon content in substrate increases from 10% to 30% as number of shot increases, and there is more carbon content detected in the centre position than the off-centre position. There is also a decrease in carbon content 35% to 25% as pressure of gas increases. |
| first_indexed | 2025-11-14T11:53:57Z |
| format | Article |
| id | intimal-980 |
| institution | INTI International University |
| institution_category | Local University |
| last_indexed | 2025-11-14T11:53:57Z |
| publishDate | 2016 |
| publisher | Trans Tech Publications |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | intimal-9802017-11-22T05:26:49Z http://eprints.intimal.edu.my/980/ Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite Low, Andrew Chun Wey Damideh, Vahid* Saw, S. H. Lim, Chin Seong* QC Physics This paper reports the deposition of carbon nanomaterials on silicon substrate using a dense plasma focus device. The film property is studied using a field emission scanning electron microscopy (FESEM) and energy dispersive X-ray (EDX). The first test was deposited using 1, 3, 5, and 7 focus shots while the second test was carried out using 1 focus shot at 2, 3, 4, 5 and 7 Torr. Both tests were conducted with neon as filling gas at 7 Torr at distance of 8cm from the anode tip. In the first test, FESEM images exhibit a non-homogenous, non-uniformed and largely agglomerated carbon deposition at all films as pressure of filling gas increases. The EDX mapping confirms that carbon content in substrate increases from 10% to 30% as number of shot increases, and there is more carbon content detected in the centre position than the off-centre position. There is also a decrease in carbon content 35% to 25% as pressure of gas increases. Trans Tech Publications 2016 Article PeerReviewed Low, Andrew Chun Wey and Damideh, Vahid* and Saw, S. H. and Lim, Chin Seong* (2016) Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite. Key Engineering Materials, 701. pp. 42-46. ISSN 1662-9795 https://www.scientific.net/KEM.701.42 10.4028/www.scientific.net/KEM.701.42 |
| spellingShingle | QC Physics Low, Andrew Chun Wey Damideh, Vahid* Saw, S. H. Lim, Chin Seong* Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
| title | Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
| title_full | Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
| title_fullStr | Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
| title_full_unstemmed | Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
| title_short | Process Development and Optimization of Carbon-Based Thin Film Deposition through Ablation of Graphite |
| title_sort | process development and optimization of carbon-based thin film deposition through ablation of graphite |
| topic | QC Physics |
| url | http://eprints.intimal.edu.my/980/ http://eprints.intimal.edu.my/980/ http://eprints.intimal.edu.my/980/ |