Improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating
Micro-Wire Electro-discharge machining (-WEDM) is a nonconventional machining technology which is extensively used for metal based micro fabrication process. This is a non-contact machining process where material removal is taken place by electro-thermal action. -WEDM process is difficult to be...
| Main Authors: | , , |
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| Format: | Proceeding Paper |
| Language: | English English |
| Published: |
2014
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| Online Access: | http://irep.iium.edu.my/37351/ http://irep.iium.edu.my/37351/1/ICOMM_2014_aous.pdf http://irep.iium.edu.my/37351/2/ICOMM_2014_proof.pdf |
| _version_ | 1848781399070343168 |
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| author | Rasheed, Aous Naji Abdul Muthalif, Asan Gani Saleh, Tanveer |
| author_facet | Rasheed, Aous Naji Abdul Muthalif, Asan Gani Saleh, Tanveer |
| author_sort | Rasheed, Aous Naji |
| building | IIUM Repository |
| collection | Online Access |
| description | Micro-Wire Electro-discharge machining (-WEDM) is a nonconventional machining technology which is extensively
used for metal based micro fabrication process. This is a non-contact machining process where material removal is
taken place by electro-thermal action. -WEDM process is difficult to be applied for semiconductor material like
Silicon (Si). In this paper a new approach is proposed for machining polished Si (p-type, resistivity 1-50 -cm) wafer.
In this method, initially Si workpiece is coated with a conductive material (gold for this study) and then -WEDM
operation is carried out. Finally, after WEDM operation, the conductive layer is removed from the polished Si
substrate without damaging the substrate. WEDM process stability was found to be improved (up to 60 times for
certain machining condition) if coated Si wafer is used as compared to uncoated Si workpiece. Material removal rate
was also found to be increased by a good margin (~ 100% maximum) for coated Si wafer. Overall this new method of
-WEDM operation of polished Si wafer has been found to be more efficient and useful. |
| first_indexed | 2025-11-14T15:48:56Z |
| format | Proceeding Paper |
| id | iium-37351 |
| institution | International Islamic University Malaysia |
| institution_category | Local University |
| language | English English |
| last_indexed | 2025-11-14T15:48:56Z |
| publishDate | 2014 |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | iium-373512015-01-12T15:22:35Z http://irep.iium.edu.my/37351/ Improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating Rasheed, Aous Naji Abdul Muthalif, Asan Gani Saleh, Tanveer T Technology (General) Micro-Wire Electro-discharge machining (-WEDM) is a nonconventional machining technology which is extensively used for metal based micro fabrication process. This is a non-contact machining process where material removal is taken place by electro-thermal action. -WEDM process is difficult to be applied for semiconductor material like Silicon (Si). In this paper a new approach is proposed for machining polished Si (p-type, resistivity 1-50 -cm) wafer. In this method, initially Si workpiece is coated with a conductive material (gold for this study) and then -WEDM operation is carried out. Finally, after WEDM operation, the conductive layer is removed from the polished Si substrate without damaging the substrate. WEDM process stability was found to be improved (up to 60 times for certain machining condition) if coated Si wafer is used as compared to uncoated Si workpiece. Material removal rate was also found to be increased by a good margin (~ 100% maximum) for coated Si wafer. Overall this new method of -WEDM operation of polished Si wafer has been found to be more efficient and useful. 2014 Proceeding Paper PeerReviewed application/pdf en http://irep.iium.edu.my/37351/1/ICOMM_2014_aous.pdf application/pdf en http://irep.iium.edu.my/37351/2/ICOMM_2014_proof.pdf Rasheed, Aous Naji and Abdul Muthalif, Asan Gani and Saleh, Tanveer (2014) Improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating. In: 9th International Conference on MicroManufacturing (ICOMM 2014), 25 - 28 Mar 2014, Singapore. http://minds.wisconsin.edu/handle/1793/68989?show=full |
| spellingShingle | T Technology (General) Rasheed, Aous Naji Abdul Muthalif, Asan Gani Saleh, Tanveer Improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating |
| title | Improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating |
| title_full | Improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating |
| title_fullStr | Improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating |
| title_full_unstemmed | Improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating |
| title_short | Improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating |
| title_sort | improving μ-wire electro-discharge machining operation of polished silicon wafer by conductive coating |
| topic | T Technology (General) |
| url | http://irep.iium.edu.my/37351/ http://irep.iium.edu.my/37351/ http://irep.iium.edu.my/37351/1/ICOMM_2014_aous.pdf http://irep.iium.edu.my/37351/2/ICOMM_2014_proof.pdf |