Optimization of the process modules for a top-down silicon
nanowire fabrication using optical lithography and
orientation dependent etching

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Optimization of the process modules for a top-down silicon nanowire fabrication using optical lithography and orientation dependent etching

A top-down silicon nanowire fabrication using a combination of optical lithography and orientation dependent etching has been developed using Silicon-on Insulator (SOI) as the starting substrate. The design of experiments for the optimization of the process flow especially on the orientation depen...

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Bibliographic Details
Main Authors:	Za'bah, Nor Farahidah, Kwa, Kelvin S. K., O'Neill, Anthony
Format:	Article
Language:	English
Published:	Trans Tech Publications, Switzerland 2013
Subjects:	QD Chemistry TS Manufactures
Online Access:	http://irep.iium.edu.my/28378/ http://irep.iium.edu.my/28378/1/Optimization_of_the_Process_Modules_for_a_Top-Down_Silicon_NW.pdf

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