An alternative polymeric protection mask for bulk KOH etching of silicon
The utilization of a newly developed photosensitive polymeric coating, ProTEK PSB plays a significant role in realizing simple process steps in the fabrication of MEMS devices using bulk micromachining technology. The photosensitive coating serves as an alternative to the conventional silicon n...
| Main Authors: | , , , |
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| Format: | Proceeding Paper |
| Language: | English |
| Published: |
2012
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| Subjects: | |
| Online Access: | http://irep.iium.edu.my/24999/ http://irep.iium.edu.my/24999/1/an_alternative_polymeric.pdf |
| _version_ | 1848779390796693504 |
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| author | Ab Rahim, Rosminazuin Bais, Badariah Yeop Majlis, Burhanuddin Sugandi, Gandi |
| author_facet | Ab Rahim, Rosminazuin Bais, Badariah Yeop Majlis, Burhanuddin Sugandi, Gandi |
| author_sort | Ab Rahim, Rosminazuin |
| building | IIUM Repository |
| collection | Online Access |
| description | The utilization of a newly developed photosensitive
polymeric coating, ProTEK PSB plays a significant role in
realizing simple process steps in the fabrication of MEMS
devices using bulk micromachining technology. The
photosensitive coating serves as an alternative to the
conventional silicon nitride mask of bulk KOH etching in
devising MEMS devices, particularly suspended
microcantilever structure. Although the coating is an excellent
outer protective layer from any pinhole issues, the lateral
etching in KOH solution is prominent, which results in an
undercut issue. Therefore, the combination of ProTEK PSB
and thermal oxide layer was studied for its possibility in
obtaining minimum undercut-etch depth ratio of the polymeric
coating in KOH (45%wt, 80oC). The combination of ProTEK
PSB patterned on thermal oxide results in an effective etching
condition attributed by minimum undercut ratio with respect
to the etch depth. |
| first_indexed | 2025-11-14T15:17:01Z |
| format | Proceeding Paper |
| id | iium-24999 |
| institution | International Islamic University Malaysia |
| institution_category | Local University |
| language | English |
| last_indexed | 2025-11-14T15:17:01Z |
| publishDate | 2012 |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | iium-249992025-02-08T08:21:16Z http://irep.iium.edu.my/24999/ An alternative polymeric protection mask for bulk KOH etching of silicon Ab Rahim, Rosminazuin Bais, Badariah Yeop Majlis, Burhanuddin Sugandi, Gandi TP1080 Polymers, plastics and their manufacture The utilization of a newly developed photosensitive polymeric coating, ProTEK PSB plays a significant role in realizing simple process steps in the fabrication of MEMS devices using bulk micromachining technology. The photosensitive coating serves as an alternative to the conventional silicon nitride mask of bulk KOH etching in devising MEMS devices, particularly suspended microcantilever structure. Although the coating is an excellent outer protective layer from any pinhole issues, the lateral etching in KOH solution is prominent, which results in an undercut issue. Therefore, the combination of ProTEK PSB and thermal oxide layer was studied for its possibility in obtaining minimum undercut-etch depth ratio of the polymeric coating in KOH (45%wt, 80oC). The combination of ProTEK PSB patterned on thermal oxide results in an effective etching condition attributed by minimum undercut ratio with respect to the etch depth. 2012-07-12 Proceeding Paper PeerReviewed application/pdf en http://irep.iium.edu.my/24999/1/an_alternative_polymeric.pdf Ab Rahim, Rosminazuin and Bais, Badariah and Yeop Majlis, Burhanuddin and Sugandi, Gandi (2012) An alternative polymeric protection mask for bulk KOH etching of silicon. In: 2012 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP), 25-27 April 2012, Cannes, France. http://ieeexplore.ieee.org/xpls/abs_all.jsp?arnumber=6235295 |
| spellingShingle | TP1080 Polymers, plastics and their manufacture Ab Rahim, Rosminazuin Bais, Badariah Yeop Majlis, Burhanuddin Sugandi, Gandi An alternative polymeric protection mask for bulk KOH etching of silicon |
| title | An alternative polymeric protection mask for bulk KOH etching of silicon |
| title_full | An alternative polymeric protection mask for bulk KOH etching of silicon |
| title_fullStr | An alternative polymeric protection mask for bulk KOH etching of silicon |
| title_full_unstemmed | An alternative polymeric protection mask for bulk KOH etching of silicon |
| title_short | An alternative polymeric protection mask for bulk KOH etching of silicon |
| title_sort | alternative polymeric protection mask for bulk koh etching of silicon |
| topic | TP1080 Polymers, plastics and their manufacture |
| url | http://irep.iium.edu.my/24999/ http://irep.iium.edu.my/24999/ http://irep.iium.edu.my/24999/1/an_alternative_polymeric.pdf |