Modeling of the reliability baseline for process control monitoring kerf structures

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Modeling of the reliability baseline for process control monitoring kerf structures

We present the Product Chip Monitor-Wafer Level Reliability (PCM-WLR) model and characteristic of a 45nm thick gate-oxide (GOX), trench DMOS technology. The process control monitor (PCM) refers to the suite of test structures usually placed in the scribe line (alternatively named kerf, street or tes...

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Bibliographic Details
Main Authors:	Izuddin, Ismah, Kamaruddin, Mohd. Hanif, Nordin, Anis Nurashikin
Format:	Proceeding Paper
Language:	English
Published:	2011
Subjects:	TA Engineering (General). Civil engineering (General)
Online Access:	http://irep.iium.edu.my/19885/ http://irep.iium.edu.my/19885/1/Modeling_of_the_Reliability_Baseline_for_Process.pdf

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