Modeling and fabrication of CMOS surface acoustic wave resonators

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Modeling and fabrication of CMOS surface acoustic wave resonators

A fully integrated two-port surface acoustic wave (SAW) resonator, fabricated using a standard 0.6- m complementary metal–oxide semiconductor (CMOS) process is described in this paper. Only three micromachining processes, namely, reactive ion etching, zinc–oxide deposition, and wet etching, impleme...

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Bibliographic Details
Main Authors:	Nordin, Anis Nurashikin, Zaghloul, Mona E.
Format:	Article
Language:	English
Published:	IEEE 2007
Subjects:	TK7885 Computer engineering
Online Access:	http://irep.iium.edu.my/1933/ http://irep.iium.edu.my/1933/4/04195673.pdf

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