Structure formation in atom lithography using geometric collimation

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Structure formation in atom lithography using geometric collimation

Atom lithography uses standing wave light fields as arrays of lenses to focus neutral atom beams into line patterns on a substrate. Laser cooled atom beams are commonly used, but an atom beam source with a small opening placed at a large distance from a substrate creates atom beams which are locally...

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Bibliographic Details
Main Authors:	Meijer, T., Beardmore, Joshua, Fabrie, C., Van Lieshout, J., Notermans, R., Sang, R., Vredenbregt, E., Van Leeuwen, K.
Format:	Journal Article
Published:	2011
Online Access:	http://hdl.handle.net/20.500.11937/66464

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