Carbon diffusion in alumina from carbon and Ti2AlC thin films
Carbon diffusion is observed in single crystal a-Al2O3 substrates from carbon and Ti2AlC thin filmssynthesized via pulsed cathodic arc deposition. Diffusion was found to occur at substratetemperatures of 570 C and above. The diffusion coefficient of carbon in a-Al2O3 is estimated to beof the order 3...
| Main Authors: | , , , , |
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| Format: | Journal Article |
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American Institute of Physics
2011
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| Online Access: | http://hdl.handle.net/20.500.11937/6561 |
| _version_ | 1848745111290118144 |
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| author | Guenette, M. Tucker, Mark Ionescu, M. Bilek, M. McKenzie, D. |
| author_facet | Guenette, M. Tucker, Mark Ionescu, M. Bilek, M. McKenzie, D. |
| author_sort | Guenette, M. |
| building | Curtin Institutional Repository |
| collection | Online Access |
| description | Carbon diffusion is observed in single crystal a-Al2O3 substrates from carbon and Ti2AlC thin filmssynthesized via pulsed cathodic arc deposition. Diffusion was found to occur at substratetemperatures of 570 C and above. The diffusion coefficient of carbon in a-Al2O3 is estimated to beof the order 3 1013 cm2/s for deposition temperatures in the 570–770 C range by examiningelastic recoil detection analysis (ERDA) elemental depth profiles. It is suggested that an appropriatediffusion barrier may be useful when depositing carbon containing thin films on a-Al2O3 substratesat high temperatures. |
| first_indexed | 2025-11-14T06:12:10Z |
| format | Journal Article |
| id | curtin-20.500.11937-6561 |
| institution | Curtin University Malaysia |
| institution_category | Local University |
| last_indexed | 2025-11-14T06:12:10Z |
| publishDate | 2011 |
| publisher | American Institute of Physics |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | curtin-20.500.11937-65612017-09-13T16:06:09Z Carbon diffusion in alumina from carbon and Ti2AlC thin films Guenette, M. Tucker, Mark Ionescu, M. Bilek, M. McKenzie, D. Carbon diffusion is observed in single crystal a-Al2O3 substrates from carbon and Ti2AlC thin filmssynthesized via pulsed cathodic arc deposition. Diffusion was found to occur at substratetemperatures of 570 C and above. The diffusion coefficient of carbon in a-Al2O3 is estimated to beof the order 3 1013 cm2/s for deposition temperatures in the 570–770 C range by examiningelastic recoil detection analysis (ERDA) elemental depth profiles. It is suggested that an appropriatediffusion barrier may be useful when depositing carbon containing thin films on a-Al2O3 substratesat high temperatures. 2011 Journal Article http://hdl.handle.net/20.500.11937/6561 10.1063/1.3573490 American Institute of Physics restricted |
| spellingShingle | Guenette, M. Tucker, Mark Ionescu, M. Bilek, M. McKenzie, D. Carbon diffusion in alumina from carbon and Ti2AlC thin films |
| title | Carbon diffusion in alumina from carbon and Ti2AlC thin films |
| title_full | Carbon diffusion in alumina from carbon and Ti2AlC thin films |
| title_fullStr | Carbon diffusion in alumina from carbon and Ti2AlC thin films |
| title_full_unstemmed | Carbon diffusion in alumina from carbon and Ti2AlC thin films |
| title_short | Carbon diffusion in alumina from carbon and Ti2AlC thin films |
| title_sort | carbon diffusion in alumina from carbon and ti2alc thin films |
| url | http://hdl.handle.net/20.500.11937/6561 |