Analysis of nano-grating-assisted light absorption enhancement in metal-semiconductor-metal photodetectors patterned using focused ion-beam lithography

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Analysis of nano-grating-assisted light absorption enhancement in metal-semiconductor-metal photodetectors patterned using focused ion-beam lithography

We present finite-difference time-domain (FDTD) analysis results of light absorption enhancement factor dependence on the profile shape of nano-gratings etched into the surfaces of metal-semiconductor-metal photodetector (MSM-PD) structures. The MSM-PDs patterned by nano-gratings are optimized geome...

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Bibliographic Details
Main Authors:	Das, Narottam, Karar, A., Vasiliev, M., Tan, C., Alameh, K., Lee, Y.
Format:	Journal Article
Published:	2011
Online Access:	http://hdl.handle.net/20.500.11937/55219

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