Scratch Fracture of Polycrystalline Silicon Wafers

Fracture of silicon wafers is responsible for lower than desirable manufacturing yields in the photovoltaic industry. This study investigates the fracture response of polycrystalline silicon wafers under sliding contacts at different length scales, by means of macro and microscratch tests which simu...

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Main Authors: Borrero-Lõpez, O., Vodenitcharova, T., Quadir, Md Zakaria, Hoffman, M.
Format: Journal Article
Published: Wiley-Blackwell Publishing, Inc. 2015
Online Access:http://hdl.handle.net/20.500.11937/53286
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author Borrero-Lõpez, O.
Vodenitcharova, T.
Quadir, Md Zakaria
Hoffman, M.
author_facet Borrero-Lõpez, O.
Vodenitcharova, T.
Quadir, Md Zakaria
Hoffman, M.
author_sort Borrero-Lõpez, O.
building Curtin Institutional Repository
collection Online Access
description Fracture of silicon wafers is responsible for lower than desirable manufacturing yields in the photovoltaic industry. This study investigates the fracture response of polycrystalline silicon wafers under sliding contacts at different length scales, by means of macro and microscratch tests which simulate cutting processes. The dominant fracture modes were found to be partial cone cracking (macro) and radial cracking (micro). Statistical analysis of the critical loads for crack initiation showed that polycrystalline wafers are weaker than their single-crystal counterparts, that is, they crack at lower applied loads under comparable conditions. Moreover, the Weibull modulus of polycrystalline silicon was found to be the average of the relevant single-crystal directions. Subsequent microscopic observations and flexure tests reveal that the lower resistance of polycrystalline silicon to scratch fracture is due mainly to the presence of relatively large polishing defects, and not to the weakness of its grain boundaries. Alternatives are proposed to minimize damage during ingot cutting, with a view to minimizing wafer breakages during wafer handling and machining.
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spelling curtin-20.500.11937-532862017-10-17T01:20:14Z Scratch Fracture of Polycrystalline Silicon Wafers Borrero-Lõpez, O. Vodenitcharova, T. Quadir, Md Zakaria Hoffman, M. Fracture of silicon wafers is responsible for lower than desirable manufacturing yields in the photovoltaic industry. This study investigates the fracture response of polycrystalline silicon wafers under sliding contacts at different length scales, by means of macro and microscratch tests which simulate cutting processes. The dominant fracture modes were found to be partial cone cracking (macro) and radial cracking (micro). Statistical analysis of the critical loads for crack initiation showed that polycrystalline wafers are weaker than their single-crystal counterparts, that is, they crack at lower applied loads under comparable conditions. Moreover, the Weibull modulus of polycrystalline silicon was found to be the average of the relevant single-crystal directions. Subsequent microscopic observations and flexure tests reveal that the lower resistance of polycrystalline silicon to scratch fracture is due mainly to the presence of relatively large polishing defects, and not to the weakness of its grain boundaries. Alternatives are proposed to minimize damage during ingot cutting, with a view to minimizing wafer breakages during wafer handling and machining. 2015 Journal Article http://hdl.handle.net/20.500.11937/53286 10.1111/jace.13620 Wiley-Blackwell Publishing, Inc. restricted
spellingShingle Borrero-Lõpez, O.
Vodenitcharova, T.
Quadir, Md Zakaria
Hoffman, M.
Scratch Fracture of Polycrystalline Silicon Wafers
title Scratch Fracture of Polycrystalline Silicon Wafers
title_full Scratch Fracture of Polycrystalline Silicon Wafers
title_fullStr Scratch Fracture of Polycrystalline Silicon Wafers
title_full_unstemmed Scratch Fracture of Polycrystalline Silicon Wafers
title_short Scratch Fracture of Polycrystalline Silicon Wafers
title_sort scratch fracture of polycrystalline silicon wafers
url http://hdl.handle.net/20.500.11937/53286