Fabrication of photoelectrode materials

In this chapter, a number of methods for the fabrication of film-structured photoelectrode materials were selectively reviewed. Sol-gel methods have long been employed for film fabrications. Direct assembly of particulate photocatalysts was also shortly discussed. The emphasis was placed on the deve...

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Main Authors: Zhang, H., Li, Xin Yong, Chen, G.
Format: Book Chapter
Published: Springer New York 2010
Online Access:http://hdl.handle.net/20.500.11937/46574
_version_ 1848757597216178176
author Zhang, H.
Li, Xin Yong
Chen, G.
author_facet Zhang, H.
Li, Xin Yong
Chen, G.
author_sort Zhang, H.
building Curtin Institutional Repository
collection Online Access
description In this chapter, a number of methods for the fabrication of film-structured photoelectrode materials were selectively reviewed. Sol-gel methods have long been employed for film fabrications. Direct assembly of particulate photocatalysts was also shortly discussed. The emphasis was placed on the development of photoelectrodes with enhanced photocatalytic performance due to either light absorption enhancement or increase in the separation of photogenerated charge carriers. Photocatalysts with enhanced light absorption were successfully developed by various doping techniques. And those with increase in charge carrier separations were made to have special crystalline structures such as nanorod/nanotubular arrays, interfacial region between coupled semiconductor components, and metal/semiconductor heterojunctions etc. Other structural characteristics such as high surface area and porosity were also achieved by various fabrication techniques as will be illustrated in this chapter. © 2010 Springer-Verlag New York.
first_indexed 2025-11-14T09:30:37Z
format Book Chapter
id curtin-20.500.11937-46574
institution Curtin University Malaysia
institution_category Local University
last_indexed 2025-11-14T09:30:37Z
publishDate 2010
publisher Springer New York
recordtype eprints
repository_type Digital Repository
spelling curtin-20.500.11937-465742017-09-13T13:38:15Z Fabrication of photoelectrode materials Zhang, H. Li, Xin Yong Chen, G. In this chapter, a number of methods for the fabrication of film-structured photoelectrode materials were selectively reviewed. Sol-gel methods have long been employed for film fabrications. Direct assembly of particulate photocatalysts was also shortly discussed. The emphasis was placed on the development of photoelectrodes with enhanced photocatalytic performance due to either light absorption enhancement or increase in the separation of photogenerated charge carriers. Photocatalysts with enhanced light absorption were successfully developed by various doping techniques. And those with increase in charge carrier separations were made to have special crystalline structures such as nanorod/nanotubular arrays, interfacial region between coupled semiconductor components, and metal/semiconductor heterojunctions etc. Other structural characteristics such as high surface area and porosity were also achieved by various fabrication techniques as will be illustrated in this chapter. © 2010 Springer-Verlag New York. 2010 Book Chapter http://hdl.handle.net/20.500.11937/46574 10.1007/978-0-387-68318-8_18 Springer New York restricted
spellingShingle Zhang, H.
Li, Xin Yong
Chen, G.
Fabrication of photoelectrode materials
title Fabrication of photoelectrode materials
title_full Fabrication of photoelectrode materials
title_fullStr Fabrication of photoelectrode materials
title_full_unstemmed Fabrication of photoelectrode materials
title_short Fabrication of photoelectrode materials
title_sort fabrication of photoelectrode materials
url http://hdl.handle.net/20.500.11937/46574