Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding

The epoxy samples were implanted with heavy ions such as tungsten (W), gold (Au) and lead (Pb) to investigate the attenuation characteristics of these composites. Near-surface composition depth profiling of ion-implanted epoxy systems was studied using Rutherford Backscattering Spectroscopy (RBS). T...

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Main Authors: Noor Azman, N., Siddiqu, S., Ionescu, M., Low, Jim
Format: Journal Article
Published: Oxford University Press 2012
Subjects:
Online Access:http://hdl.handle.net/20.500.11937/4516
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author Noor Azman, N.
Siddiqu, S.
Ionescu, M.
Low, Jim
author_facet Noor Azman, N.
Siddiqu, S.
Ionescu, M.
Low, Jim
author_sort Noor Azman, N.
building Curtin Institutional Repository
collection Online Access
description The epoxy samples were implanted with heavy ions such as tungsten (W), gold (Au) and lead (Pb) to investigate the attenuation characteristics of these composites. Near-surface composition depth profiling of ion-implanted epoxy systems was studied using Rutherford Backscattering Spectroscopy (RBS). The effect of implanted ions on the X-ray attenuation was studied with a general diagnostic X-ray machine with X-ray tube voltages from 40 to 100 kV at constant exposure 10 mAs. Results show that the threshold of implanted ions above which X-ray mass attenuation coefficient, µm of the ion-implanted epoxy composite is distinguishably higher than the µm of the pure epoxy sample is different for W, Au and Pb.
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institution Curtin University Malaysia
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publishDate 2012
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spelling curtin-20.500.11937-45162017-09-13T15:54:07Z Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding Noor Azman, N. Siddiqu, S. Ionescu, M. Low, Jim X-ray shielding X-ray mass attenuation coefficient Implanted ions Nominal dose Implanted dose Ion-implantation The epoxy samples were implanted with heavy ions such as tungsten (W), gold (Au) and lead (Pb) to investigate the attenuation characteristics of these composites. Near-surface composition depth profiling of ion-implanted epoxy systems was studied using Rutherford Backscattering Spectroscopy (RBS). The effect of implanted ions on the X-ray attenuation was studied with a general diagnostic X-ray machine with X-ray tube voltages from 40 to 100 kV at constant exposure 10 mAs. Results show that the threshold of implanted ions above which X-ray mass attenuation coefficient, µm of the ion-implanted epoxy composite is distinguishably higher than the µm of the pure epoxy sample is different for W, Au and Pb. 2012 Journal Article http://hdl.handle.net/20.500.11937/4516 10.1016/j.nimb.2012.06.004 Oxford University Press restricted
spellingShingle X-ray shielding
X-ray mass attenuation coefficient
Implanted ions
Nominal dose
Implanted dose
Ion-implantation
Noor Azman, N.
Siddiqu, S.
Ionescu, M.
Low, Jim
Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding
title Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding
title_full Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding
title_fullStr Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding
title_full_unstemmed Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding
title_short Synthesis and characterisation of ion-implanted epoxy composites for X-ray shielding
title_sort synthesis and characterisation of ion-implanted epoxy composites for x-ray shielding
topic X-ray shielding
X-ray mass attenuation coefficient
Implanted ions
Nominal dose
Implanted dose
Ion-implantation
url http://hdl.handle.net/20.500.11937/4516