Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol
The attachment of acetyl-protected alkynethiol groups onto silicon(100) surfaces was achieved using a hydrosilylation methodology. Subsequent deprotection of the thiols using either hydrochloric acid or ammonia solution was investigated using X-ray photoelectron spectroscopy (XPS), and compared with...
| Main Authors: | , , , , , |
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| Format: | Conference Paper |
| Published: |
2010
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| Online Access: | http://hdl.handle.net/20.500.11937/42676 |
| _version_ | 1848756486466961408 |
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| author | Ng, C. Le Saux, G. Chockalingam, M. Ciampi, Simone Harper, J. Gooding, J. |
| author_facet | Ng, C. Le Saux, G. Chockalingam, M. Ciampi, Simone Harper, J. Gooding, J. |
| author_sort | Ng, C. |
| building | Curtin Institutional Repository |
| collection | Online Access |
| description | The attachment of acetyl-protected alkynethiol groups onto silicon(100) surfaces was achieved using a hydrosilylation methodology. Subsequent deprotection of the thiols using either hydrochloric acid or ammonia solution was investigated using X-ray photoelectron spectroscopy (XPS), and compared with similar reaction in solution. It was found that ammonia solution was more efficient than hydrochloric acid for the deprotection step. However, the deprotection was much less efficient on the surface than in solution. © 2010 IEEE. |
| first_indexed | 2025-11-14T09:12:58Z |
| format | Conference Paper |
| id | curtin-20.500.11937-42676 |
| institution | Curtin University Malaysia |
| institution_category | Local University |
| last_indexed | 2025-11-14T09:12:58Z |
| publishDate | 2010 |
| recordtype | eprints |
| repository_type | Digital Repository |
| spelling | curtin-20.500.11937-426762018-03-29T09:07:46Z Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol Ng, C. Le Saux, G. Chockalingam, M. Ciampi, Simone Harper, J. Gooding, J. The attachment of acetyl-protected alkynethiol groups onto silicon(100) surfaces was achieved using a hydrosilylation methodology. Subsequent deprotection of the thiols using either hydrochloric acid or ammonia solution was investigated using X-ray photoelectron spectroscopy (XPS), and compared with similar reaction in solution. It was found that ammonia solution was more efficient than hydrochloric acid for the deprotection step. However, the deprotection was much less efficient on the surface than in solution. © 2010 IEEE. 2010 Conference Paper http://hdl.handle.net/20.500.11937/42676 10.1109/ICONN.2010.6045195 restricted |
| spellingShingle | Ng, C. Le Saux, G. Chockalingam, M. Ciampi, Simone Harper, J. Gooding, J. Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol |
| title | Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol |
| title_full | Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol |
| title_fullStr | Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol |
| title_full_unstemmed | Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol |
| title_short | Preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol |
| title_sort | preparation of thiol-terminated monolayers on silicon(100) surfaces using thioacetyl-protected alkynethiol |
| url | http://hdl.handle.net/20.500.11937/42676 |