Phosphorus d-doped silicon: mixed-atom pseudopotentials and dopant disorder effects

Within a full density functional theory framework we calculate the band structure and doping potential for phosphorus d-doped silicon. We compare two different representations of the dopant plane; pseudo-atoms in which the nuclear charge is fractional between silicon and phosphorus, and explicit arr...

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Main Authors: Carter, Damien, Marks, Nigel, Warschkow, O., McKenzie, D.
Format: Journal Article
Published: IOP 2011
Subjects:
Online Access:http://stacks.iop.org/Nano/22/065701
http://hdl.handle.net/20.500.11937/24873
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author Carter, Damien
Marks, Nigel
Warschkow, O.
McKenzie, D.
author_facet Carter, Damien
Marks, Nigel
Warschkow, O.
McKenzie, D.
author_sort Carter, Damien
building Curtin Institutional Repository
collection Online Access
description Within a full density functional theory framework we calculate the band structure and doping potential for phosphorus d-doped silicon. We compare two different representations of the dopant plane; pseudo-atoms in which the nuclear charge is fractional between silicon and phosphorus, and explicit arrangements employing distinct silicon and phosphorus atoms. While the pseudo-atom approach offers several computational advantages, the explicit model calculations differ in a number of key points, including the valley splitting, the Fermi level and the width of the doping potential. These findings have implications for parameters used in device modelling.
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institution Curtin University Malaysia
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publishDate 2011
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spelling curtin-20.500.11937-248732017-09-13T15:51:05Z Phosphorus d-doped silicon: mixed-atom pseudopotentials and dopant disorder effects Carter, Damien Marks, Nigel Warschkow, O. McKenzie, D. Phosphorus d-doped silicon Within a full density functional theory framework we calculate the band structure and doping potential for phosphorus d-doped silicon. We compare two different representations of the dopant plane; pseudo-atoms in which the nuclear charge is fractional between silicon and phosphorus, and explicit arrangements employing distinct silicon and phosphorus atoms. While the pseudo-atom approach offers several computational advantages, the explicit model calculations differ in a number of key points, including the valley splitting, the Fermi level and the width of the doping potential. These findings have implications for parameters used in device modelling. 2011 Journal Article http://hdl.handle.net/20.500.11937/24873 10.1088/0957-4484/22/6/065701 http://stacks.iop.org/Nano/22/065701 IOP restricted
spellingShingle Phosphorus d-doped silicon
Carter, Damien
Marks, Nigel
Warschkow, O.
McKenzie, D.
Phosphorus d-doped silicon: mixed-atom pseudopotentials and dopant disorder effects
title Phosphorus d-doped silicon: mixed-atom pseudopotentials and dopant disorder effects
title_full Phosphorus d-doped silicon: mixed-atom pseudopotentials and dopant disorder effects
title_fullStr Phosphorus d-doped silicon: mixed-atom pseudopotentials and dopant disorder effects
title_full_unstemmed Phosphorus d-doped silicon: mixed-atom pseudopotentials and dopant disorder effects
title_short Phosphorus d-doped silicon: mixed-atom pseudopotentials and dopant disorder effects
title_sort phosphorus d-doped silicon: mixed-atom pseudopotentials and dopant disorder effects
topic Phosphorus d-doped silicon
url http://stacks.iop.org/Nano/22/065701
http://hdl.handle.net/20.500.11937/24873